Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Guido Mertens"'
Autor:
Guido Mertens
Publikováno v:
Konstruktion. 70:56-58
Nach wie vor wird die überwiegende Mehrheit an Elektromotoren ungeregelt betrieben. Die Hybrid- Motorstarter der Produktfamilie Contactron stehen jetzt mit einer IO-Link-Schnittstelle zur Verfügung. So lassen sich neben den eindeutigen Diagnosedate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::de4f478604ae9061903ff475261f513a
https://doi.org/10.37544/0720-5953-2018-s1-56
https://doi.org/10.37544/0720-5953-2018-s1-56
Autor:
Klaus Bergmann, B Santos, Alexander von Wezyk, Takahiro Shirai, Daiki Yamatani, Yusuke Teramoto, Noritaka Ashizawa, Kunihiko Kasama, Akihisa Nagano, Yuta Taniguchi, Margarete Kops, Ralf Kops, Hironobu Yabuta, Guido Mertens
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VIII.
High-throughput actinic mask inspection tools are needed as EUVL begins to enter into volume production phase. One of the key technologies to realize such inspection tools is a high-radiance EUV source of which radiance is supposed to be as high as 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9bbb558fd368c033c8c0b2a97c09632e
https://doi.org/10.1117/12.2258139
https://doi.org/10.1117/12.2258139
Autor:
Alexander von Wezyk, Guido Mertens, Klaus Bergmann, Takahiro Shirai, Kiyotada Nakamura, Hironobu Yabuta, Akihisa Nagano, Yusuke Teramoto, Ralf Kops, Kazuya Aoki, Kunihiko Kasama, Margarete Kops, Noritaka Ashizawa, Yuta Taniguchi, B Santos
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
High-throughput and -resolution actinic mask inspection tools are needed as EUVL begins to enter into volume production phase. To realize such inspection tools, a high-radiance EUV source is necessary. Ushio’s laser-assisted discharge-produced plas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f3d959e75a09d6cba0cb2d6147991256
https://doi.org/10.1117/12.2219219
https://doi.org/10.1117/12.2219219
Autor:
Margarete Kops, Guido Mertens, Yuta Taniguchi, Alexander von Wezyk, Takahiro Shirai, Noritaka Ashizawa, Klaus Bergmann, Yusuke Teramoto, Kunihiko Kasama, Ralf Kops, Hironobu Yabuta, B Santos, Akihisa Nagano
Publikováno v:
High-Brightness Sources and Light-Driven Interactions.
A compact high-brightness EUV source is needed for high-throughput actinic mask inspection in EUV lithography. Ushio is developing a light source utilizing LDP technology where rotating Sn-covered electrodes, trigger lasers and pulsed electrical disc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59fd94ddf902a20377f40c9c844cca15
https://doi.org/10.1364/euvxray.2016.es4a.1
https://doi.org/10.1364/euvxray.2016.es4a.1
Autor:
Yusuke Teramoto, Bárbara Santos, Guido Mertens, Ralf Kops, Margarete Kops, Alexander von Wezyk, Hironobu Yabuta, Akihisa Nagano, Takahiro Shirai, Noritaka Ashizawa, Kiyotada Nakamura, Kunihiko Kasama
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6edbb0fde59ab0e5ff5e6f710922ba44
https://doi.org/10.1117/12.2086606
https://doi.org/10.1117/12.2086606
Autor:
Margarete Kops, Kiyotada Nakamura, Gota Niimi, B Santos, Ralf Kops, Yusuke Teramoto, Takuma Yokoyama, Takahiro Shirai, Noritaka Ashizawa, Guido Mertens, Hiroto Sato, Hironobu Yabuta, Kunihiko Kasama, Felix Küpper, Akihisa Nagano, Masaki Yoshioka
Publikováno v:
SPIE Proceedings.
Actinic mask inspection manufactures are currently searching for high-radiance EUV sources for their tools. LDP source, which was previously used for lithography purposes, was found to be a good candidate as it can provide sufficient power and radian
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f42282ce848c34cdcadfc66632c037d9
https://doi.org/10.1117/12.2046423
https://doi.org/10.1117/12.2046423
Autor:
Heinrich Marsmann, Mary Neubert, Ralf B. Wehrspohn, Cécile Jamois, Guido Mertens, Heinrich Matthias, Heinz-Siegfried Kitzerow, Thorsten Röder, Stefan L. Schweizer
Publikováno v:
Applied Physics Letters. 83:3036-3038
Variations of the refractive index can be utilized in order to shift the stop band in periodic structures, such as photonic crystals. We report on investigations about three-dimensional macroporous silicon structures that are filled with a liquid cry
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9ea90f06231448e1c037f395b85a2c87
https://doi.org/10.1063/1.1614000
https://doi.org/10.1063/1.1614000
Publikováno v:
Applied Physics Letters. 80:1885-1887
We have investigated the photonic band gap of normal and inverted colloidal crystals which were infiltrated with a nematic liquid crystal. In both systems, the wavelength of the photonic band gap can be tuned by adjusting the temperature. In agreemen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2ca9722093409358f322df3d2a3d231
https://doi.org/10.1063/1.1461885
https://doi.org/10.1063/1.1461885
Autor:
Guido Mertens, Heinrich Matthias, S. Frey, Helmut Foell, Heinz-Siegfried Kitzerow, Ralf B. Wehrspohn, Ulrich Goesele, Sven Matthias, Heinrich Marsmann
Publikováno v:
Tuning the Optical Response of Photonic Bandgap Structures II.
Variations of the refractive index can be utilized in order to shift the stop band in photonic crystals. Here, two- and three-dimensional structures made of macroporous silicon were filled with liquid crystals. Optical investigations in the infrared
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a52df3e118c1492c0c51c4381c28f97
https://doi.org/10.1117/12.616456
https://doi.org/10.1117/12.616456
Publikováno v:
Applied Physics Letters. 87:241108
Three-dimensionally periodic structures made of macroporous silicon with varying pore diameter show a photonic stop band in the middle infrared spectral range. A discontinuity of the periodic pore width modulation forms a planar optical resonator wit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bd077e8429baac53492110953c1cff50
https://doi.org/10.1063/1.2139846
https://doi.org/10.1063/1.2139846