Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Guido De Boer"'
Autor:
Charlotte A. Hoogstraten, Maaike M. E. Jacobs, Guido de Boer, Melissa A. E. van de Wal, Werner J. H. Koopman, Jan A. M. Smeitink, Frans G. M. Russel, Tom J. J. Schirris
Publikováno v:
Archives of Toxicology, 97, 1927-1941
Archives of Toxicology, 97, 7, pp. 1927-1941
Archives of Toxicology, 97, 7, pp. 1927-1941
Mitochondrial dysfunction is pivotal in drug-induced acute kidney injury (AKI), but the underlying mechanisms remain largely unknown. Transport proteins embedded in the mitochondrial inner membrane form a significant class of potential drug off-targe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::624b90cdb0fa6ad59940574f54a19058
https://hdl.handle.net/2066/293800
https://hdl.handle.net/2066/293800
Autor:
Stijn Willem Herman Karel Steenbrink, Guido De Boer, Stefan Landis, Jonathan Pradelles, Isabelle Servin, Guido Rademaker, Pieter Brandt, Laurent Pain, Marco Jan-Jaco Wieland, Remco Jager
Publikováno v:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019.
Mapper has installed its first product, the FLX–1200, at CEA-Leti in Grenoble (France). This is a maskless lithography system, based on massively parallel electron-beam writing with high-speed optical data transport for switching the electron beams
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::41f735bb59ed56329430f82373c5bad2
https://doi.org/10.1117/12.2514920
https://doi.org/10.1117/12.2514920
Autor:
Marco Wieland, Stijn Steenbrink, Erwin Slot, Jerry J. Peijster, Remco Jager, Michel Dansberg, Pieter Brandt, Guido De Boer, Isabelle Servin, Guido Rademaker, Stefan Landis, Jonathan Pradelles, Yoann Blancquaert, Laurent Pain
Publikováno v:
34th European Mask and Lithography Conference.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0418c6505e709736b8bc292420729eda
https://doi.org/10.1117/12.2324054
https://doi.org/10.1117/12.2324054
Autor:
Dhara Dave, Guido Rademaker, Anna Golotsvan, Erwin Slot, Ronny Haupt, T. Shapoval, Stefan Landis, Anat Marchelli, Stephane Rey, Tal Itzkovich, Laurent Pain, Guido De Boer, Jonathan Pradelles, Marco Jan-Jaco Wieland
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
One of the metrology challenges for massively parallel electron beams is to verify that all the beams that are used perform within specification. The Mapper FLX-1200 platform exposes fields horizontally segmented in 2.2 μm-wide stripes. This yields
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a008dc644c92908ce8182754eadae8f9
https://doi.org/10.1117/12.2297535
https://doi.org/10.1117/12.2297535
Autor:
Stefan Landis, Stijn Willem Herman Karel Steenbrink, Guido De Boer, Pieter Brandt, Guido Rademaker, Michel Pieter Dansberg, Jerry Johannes Martinus Peijster, Laurent Pain, Marco Jan-Jaco Wieland, Remco Jager, Jonathan Pradelles, Isabelle Servin, Yoann Blancquaert, Erwin Slot
Publikováno v:
Novel Patterning Technologies 2018.
Mapper has installed its first product, the FLX–1200, at CEA-Leti in Grenoble (France). This is a maskless lithography system, based on massively parallel electron-beam writing with high-speed optical data transport for switching the electron beams
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b0a5f20776ee3d9acbbeaeed6d6ccda
https://doi.org/10.1117/12.2300816
https://doi.org/10.1117/12.2300816
Autor:
Guido Rademaker, Remco Jager, Marco Jan-Jaco Wieland, Laurent Pain, Stijn Willem Herman Karel Steenbrink, Michel Pieter Dansberg, Jonathan Pradelles, Niels Vergeer, Pieter Brandt, Isabelle Servin, Jerry Johannes Martinus Peijster, Erwin Slot, Yoann Blancquaert, Guido De Boer, Ludovic Lattard
Publikováno v:
Emerging Patterning Technologies.
Mapper Lithography has introduced its first product, the FLX–1200, which is installed at CEA-Leti in Grenoble (France). This is a mask less lithography system, based on massively parallel electron-beam writing with high-speed optical data transport
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::11cf4255804b0d70bfda9223ddbdd7cf
https://doi.org/10.1117/12.2260878
https://doi.org/10.1117/12.2260878
Autor:
Faruk Krecinic, Erwin Slot, Shy-Jay Lin, Wen-Chuan Wang, Marco Jan-Jaco Wieland, Guido De Boer, Remco Jager, Burn Jeng Lin, Jack J. H. Chen, Stijn Willem Herman Karel Steenbrink, Bert-Jan Kampherbeek
Publikováno v:
SPIE Proceedings.
E-beam maskless lithography is a potential solution for 32-nm half-pitch (HP) node and beyond. The major concern to implement it for mass production is whether its throughput can reach a production-worthy level. Without violating the law of physics u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::71d107e0840804526e02fb7c261c24a3
https://doi.org/10.1117/12.838573
https://doi.org/10.1117/12.838573