Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Guenter Grabosch"'
Autor:
Ute Natura, Christian Muehlig, Karin Dr. Pöhl, Lutz Dr. Parthier, Martin Letz, Konrad Knapp, Guenter Grabosch
Publikováno v:
SPIE Proceedings.
Photolithography is a key technolgoy for the production of semiconductor devices. It supports the continuing trend towards higher integration density of microelectronic devices. The material used in the optics of lithography tools has to be of extrem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::817780f8db53613c38e21bcbaa6d632c
https://doi.org/10.1117/12.585247
https://doi.org/10.1117/12.585247
Publikováno v:
SPIE Proceedings.
Homogeneity residuals of the refractive index have a strong influence on the performance of lithography tools for both 193 and 157 nm application wavelengths. By systematic investigations of various defects in the real structure of CaF2 crystals, the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::181d76ea092636e69c0eaf14693d95a2
https://doi.org/10.1117/12.536310
https://doi.org/10.1117/12.536310
Publikováno v:
SPIE Proceedings.
F2 lens designs considering Intrinsic birefringence imposed more severe challenges to CaF2 manufacturing technology. In order to compensate the intrinsic birefringence other crystal orientations (100) / (110) are necessary. These other crystal orient
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f07b4fe5c3c5b0e2a801b70607fb5db0
https://doi.org/10.1117/12.485417
https://doi.org/10.1117/12.485417