Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Guan Hui Lim"'
Publikováno v:
Organic Electronics. 15:449-460
Inkjet printing is a mask-less non-contact deposition technique that is potentially suited for prototyping and manufacturing of thin-film polymer organic semiconductor devices from digital images. However new strategies are needed to achieve films wi
Autor:
Thiha Ye, Loke-Yuen Wong, Soo Jin Chua, Jing-Mei Zhuo, Guan-Hui Lim, Peter K. H. Ho, Rui-Qi Png, F. B. Shanjeera Silva
Publikováno v:
Journal of Fluid Mechanics. 713:109-122
The influence of fluid droplet properties on the droplet-on-demand jetting of a Newtonian model fluid (water–isopropanol–ethylene glycol ternary system) has been studied. The composition of the fluid was adjusted to investigate how the Ohnesorge
Autor:
Siau Ben Chiah, Zhaomin Zhu, Xing Zhou, Guojun Zhu, Shihuan Lin, Guan Hui Lim, Chengqing Wei, K. Chandrasekaran, Guan Huei See
Publikováno v:
IEEE Transactions on Electron Devices. 55:624-631
This paper presents a new concept for the MOSFET saturation voltages at the drain and source sides referenced to bulk, and applies them to the popularly used smoothing functions for the effective drain-source voltage (Vds,eff ). The proposed model no
Autor:
Chengqing Wei, Guan Hui Lim, S.C. Rustagi, Xing Zhou, Guojun Zhu, Shihuan Lin, Guan Huei See, Zhaomin Zhu
Publikováno v:
IEEE Transactions on Electron Devices. 55:616-623
This paper presents a rigorously-derived analytical solution of the Poisson equation with both electrons and holes in pure silicon, which is applied to the analysis of undoped symmetric double-gate transistors. An implicit surface-potential equation
Autor:
Guan Hui Lim
In this work, backward propagation of variance (BPV) methodology is used to develop a statistical MOSFET model for 0.35um technology to account for global process variations based on electrical data from measurements of MOSFET test structures in scri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f085155ddb3ccb100c5c5ba19e981477
https://hdl.handle.net/10356/41399
https://hdl.handle.net/10356/41399
Autor:
Xing Zhou, Chandrasekaran, K., Guan Huei See, Zhaomin Zhu, Guan Hui Lim, Shihuan Lin, Chengqing Wei, Siau Ben Chiah, Cheng, M., Sanford Chu, Liang-Choo Hsia, Subhash Rustagi
Publikováno v:
2006 8th International Conference on Solid-State & Integrated Circuit Technology Proceedings; 2006, p1193-1197, 5p
Publikováno v:
2007 International Workshop on Electron Devices and Semiconductor Technology (EDST).
A generic double-gate (DG) MOSFET follows a generalized voltage equation from the first integral of Poisson equation and Gauss' law applied at the two gates, which is implicit and, in general, non-integrable when the silicon film is doped. Only DG wi
Autor:
F. Poh, Chengqing Wei, Guojun Zhu, Guan Huei See, Guan Hui Lim, Zhaomin Zhu, Shihuan Lin, K. Khu, Y.K. Yoo, Xing Zhou
Publikováno v:
2007 IEEE Conference on Electron Devices and Solid-State Circuits.
Continued scaling down of MOSFETs, compounded with limitation in process variation control capabilities, has made MOSFET mismatch more significant for advanced technologies. In order to prevent over compensating for MOSFET mismatch in design margin,
Autor:
Chengqing Wei, Guan Huei See, Y.K. Yoo, Xing Zhou, Guan Hui Lim, Guojun Zhu, K. Khu, F. Poh, Zhaomin Zhu, Shihuan Lin
Publikováno v:
2007 IEEE Conference on Electron Devices and Solid-State Circuits.
MOSFET mismatch model based on BSIM3v3 for a CMOS 0.13 mum technology using backward propagation of variance (BPV) methodology coupled with Pelgrom model basis was developed. Test structures were carefully designed for intrinsic MOSFET drain current
Autor:
Guan Hui Lim, Guan Huei See, Liang-Choo Hsia, Zhaomin Zhu, S.C. Rustagi, Xing Zhou, Michael Chye Huat Cheng, Sanford Chu, Siau Ben Chiah, K. Chandrasekaran, Shihuan Lin, Chengqing Wei
Publikováno v:
2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings.
MOSFETs have been the building blocks of modern VLSI for decades. As classical bulk-CMOS scaling is approaching its physical limit, various types of non-classical CMOS emerge. Although different in structure, topology, and operation, different types