Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.

Design method and algorithms for directed self-assembly aware via layout decomposition in sub-7 nm circuits

Autor: Karageorgos, I. Ryckaert, J. Gronheid, R. Tung, M.C. Wong, H.-S.P. Karageorgos, E. Croes, K. Bekaert, J. Vandenberghe, G. Stucchi, M. Dehaene, W.

Major advancements in the directed self-assembly (DSA) of block copolymers have shown the technique's strong potential for via layer patterning in advanced technology nodes. Molecular scale pattern precision along with low cost processing promotes DS

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od______2127::d4538cd772ce28238813592e94d0ec7f
https://pergamos.lib.uoa.gr/uoa/dl/object/uoadl:3035842

Optical imaging metrology calibration using high voltage scanning electron microscope at after-development inspection for advanced processes

Autor: Adan, Ofer, Robinson, John C., Gutman, N., Tarshish, I., Gronheid, R., Dror, C., Michelsson, D., Backhauss, H., Levin, L., Levinski, V., Paskover, Y., Yerushalmi, L., Heidrich, T., Czerkas, S., Pohlmann, U., Laske, F.

Publikováno v: Proceedings of SPIE; March 2020, Vol. 11325 Issue: 1 p113251X-113251X-7, 1019267p

Smoothening of 193 Immersion Resist by 172 nm VUV Exposure

Autor: Kunnen, E., Vaglio Pret, A., Luere, O., Azarnouche, L., Pargon, E., Foubert, P., Gronheid, R., Shamiryan, D., Baklanov, M., Boullart, W.

Publikováno v: 56th International AVS Symposium & Topical Conferences
56th International AVS Symposium & Topical Conferences, Oct 2010, Albuquerque (USA), United States

International audience

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::5439abeabc4361559d07ff5281ffda7b
https://hal.archives-ouvertes.fr/hal-00644017

Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.