Wet silylation and oxygen plasma development of photoresists: A mature and versatile lithographic process for microelectronics and microfabrication.

Autor: Gogolides, Evangelos, Tzevelekis, Dimitrios, Grigoropoulos, Spyridon, Tegou, Evangelia, Hatzakis, Michael

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 5, p3332-3338, 7p