Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Gregory P. Thomes"'
Autor:
Jeffrey M. Lauerhaas, Chimaobi W. Mbanaso, Jeffery W. Butterbaugh, Antonio L. P. Rotondaro, Derek W. Bassett, Gregory P. Thomes, Christina Ann Rathman, Brent D. Schwab
Publikováno v:
2019 China Semiconductor Technology International Conference (CSTIC).
Cryogenic Nano-Aerosol dry cleaning is an enabling technology for defect removal on substrates where wet cleaning techniques are not practical or are difficult to implement [1–4]. Example substrates are hydrophobic low-k films, films containing cor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df5b20e0d64e93d088a54e2ae1c2b878
https://doi.org/10.1109/cstic.2019.8755703
https://doi.org/10.1109/cstic.2019.8755703
Publikováno v:
Solid State Phenomena. :181-184
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::372bf5d9593e6890594c1d4d13b57482
https://doi.org/10.4028/www.scientific.net/ssp.103-104.181
https://doi.org/10.4028/www.scientific.net/ssp.103-104.181
Publikováno v:
Solid State Phenomena. :259-262
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6477b510a8de5c576bd7141c1acc2ca1
https://doi.org/10.4028/www.scientific.net/ssp.76-77.259
https://doi.org/10.4028/www.scientific.net/ssp.76-77.259
Autor:
Gregory P. Thomes, Toshihiro Kameda, Hua Long Li, Katsutoshi Komeya, Takeshi Meguro, Yusuke Chiba
Publikováno v:
Key Engineering Materials. :59-62
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2a9bdb478ee629b63cc40ba3cfcae46
https://doi.org/10.4028/www.scientific.net/kem.161-163.59
https://doi.org/10.4028/www.scientific.net/kem.161-163.59
Autor:
M. Gopal, Gregory P. Thomes
Publikováno v:
Key Engineering Materials. :235-244
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d26c36bd42e38a55b9b2d42edf08e0b6
https://doi.org/10.4028/www.scientific.net/kem.159-160.235
https://doi.org/10.4028/www.scientific.net/kem.159-160.235
Publikováno v:
Materials Science Forum. :671-678
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3fdb7dd76d9b6f9483ac202468eefb97
https://doi.org/10.4028/www.scientific.net/msf.79-82.671
https://doi.org/10.4028/www.scientific.net/msf.79-82.671
Autor:
Nagarajan, R.M., Van Hove, J.M., Rask, S.D., Thomas, G.P., Cibuzar, G.T., Jorgenson, J.D., Chang, E.Y., Pande, K.P.
Publikováno v:
IEEE Transactions on Electron Devices; 1989, Vol. 36 Issue 1, p142-145, 4p
Publikováno v:
IEEE Transactions on Electron Devices; 1989, Vol. 36 Issue 1, p140-142, 3p
Selected, peer reviewed papers from the 13th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 12-14, 2016, Knokke, Belgium
