Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Gregory Luckman"'
Publikováno v:
SPIE Proceedings.
The temperatures that wafers reach in plasma etching processes result from a balance of several factors including energetic particle bombardment heating, exothermic chemical reactions, radiative cooling, and gas phase viscous and molecular cooling. T
Autor:
Shinji Sakaguchi, Andrew J. Blakeney, Joseph J. Sizensky, Nancy N. Greene, Gregory Luckman, Shiro Tan, Thomas R. Sarubbi
Publikováno v:
SPIE Proceedings.
A new class of novolacs has been developed which imparts a unique blend of sensitivity, submicron resolution and image thennai flow resistance to positive photoresist formulations. The novolac system is based upon condensation of metaand para-cresol
Autor:
Gregory Luckman
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 11:99
This article presents a technique for using the onset of reticulation, or hazing, of a novolac‐diazonaphthoquinone (DNQ) photoresist to monitor differences in peak temperatures between silicon wafers subjected to plasma processing. The technique ex
Autor:
Gregory Luckman, Richard S. Polizzotti
Publikováno v:
Metallurgical Transactions A. 16:133-136
We consider the effect of a chemisorbing surface reaction poison on the transition from internal to external oxidation for a model binary alloy subject to selective oxidation. We solve the diffusion equations for internal oxidation, using the rate of
Publikováno v:
Surface Science. 136:184-194
The adsorption of oxygen on polycrystalline and thin film copper samples was studied with the solid state electrochemical cell: Cu,Cu 2 O¦7.5wt%CaO/ZrO 2 ¦Cu in ultrahigh vacuum. The oxygen partial pressure in the bulk of the copper sample was cont
Publikováno v:
Surface Science. 121:61-84
A new technique is presented for the determination of solute diffusivities from Auger measurements of the kinetics of free surface segregation. The technique utilizes the final, non-uniform bulk concentration of one surface segregation run as the ini
Publikováno v:
Metallurgical Transactions A. 12:253-259
The isothermal segregation kinetics of phosphorus to Fe and Fe-based alloy surfaces have been monitored from 783 to 923 K using Auger electron spectroscopy. The P segregation kinetics are consistent with a model which assumes bulk diffusion of P to b
Publikováno v:
Surface Science Letters. 121:A363
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