Zobrazeno 1 - 10
of 38
pro vyhledávání: '"Gregory Breyta"'
Autor:
Linda K. Sundberg, Daniel P. Sanders, A. D. Allen, R. Sooriyakumaran, R. A. Dipietro, P. J. Brock, Gregory Breyta
Publikováno v:
Journal of Photopolymer Science and Technology. 19:569-572
The fundamental properties of a series of hexafluoroalcohol-bearing methacrylate polymers (HFA-MA) are reported here. The material behavior is heavily influenced by the linking group between the methacrylate ester (or polymer backbone) and the hexafl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7ed915a5d4c62b6781d6138f470158a1
https://doi.org/10.2494/photopolymer.19.569
https://doi.org/10.2494/photopolymer.19.569
Mechanistic Studies of the Acidolysis Reactions Occurring in Silicon-Containing Bilayer Photoresists
Autor:
Gregory M. Wallraff, Mark H. Sherwood, Ilya Zharov, Gregory Breyta, Carl E. Larson, Ratnam Sooriyakamaran, Richard Anthony DiPietro, Josef Michl
Publikováno v:
Chemistry of Materials. 14:656-663
As the feature sizes of semiconductor devices continue to shrink, there is an increasing interest in thin film imaging approaches such as silicon-based bilayer resists. We have developed such a res...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6543c21b1031ac2fa359c58ad249d844
https://doi.org/10.1021/cm010660i
https://doi.org/10.1021/cm010660i
Autor:
Mark H. Sherwood, H. D. Truong, Hiroshi Ito, Gregory Breyta, Carl E. Larson, Robert D. Allen, Dolores C. Miller, P. J. Brock, Gregory M. Wallraff, Nicolette Fender
Publikováno v:
Journal of Photopolymer Science and Technology. 14:583-593
Unexpectedly good UV transmittance at 157nm of poly(norbornene sulfone) bearing a pendant hexafluoroisopropanol functionality has prompted us to employ this fluoroalcohol as an acid group for the design of chemical amplification resists for use in 15
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed256f0dafee9af08b1de8b9bd4d49ef
https://doi.org/10.2494/photopolymer.14.583
https://doi.org/10.2494/photopolymer.14.583
Autor:
Gregory Breyta, R. Sooriyakumaran, Carl E. Larson, Qinghuang Lin, Karen Petrillo, Marie Angelopoulos, Juliann Opitz, Gregory M. Wallraff, D. LaTulip, Katherina Babich, John P. Simons, R. A. Dipietro, Mark H. Sherwood, Donald C. Hofer, Debra Fenzel-Alexander, J. Muete
Publikováno v:
Journal of Photopolymer Science and Technology. 11:673-679
Thin film imaging resists (TSI and Bilayer systems) confine the imaging to a thin resist film (in the case of a bilayer system) which is subsequently transferred to a thicker polymeric underlayer. This approach has a number of potential advantages in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e7f8debc9c158a786adb50850114d5d5
https://doi.org/10.2494/photopolymer.11.673
https://doi.org/10.2494/photopolymer.11.673
Autor:
Thomas I. Wallow, Carl E. Larson, Juliann Opitz, Robert D. Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Gregory Breyta, Donald C. Hofer
Publikováno v:
Journal of Photopolymer Science and Technology. 10:503-510
The impact of photoacid generator (PAG) structure has been largely ignored for 193nm single layer resists. Most published work to date has involved the use of triflic or metallic (antimonate or arsenate) photoacids. The importance of the PAG structur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4cc1c03bb6d759148a4f4f0a857fd800
https://doi.org/10.2494/photopolymer.10.503
https://doi.org/10.2494/photopolymer.10.503
Autor:
Hoosung Lee, R. Sooriyakumaran, William D. Hinsberg, William P. England, Nicholas J. Clecak, Gregory Breyta, Do Y. Yoon, Hiroshi Ito
Publikováno v:
Journal of Photopolymer Science and Technology. 6:547-562
A molecular design for stabilization of chemical amplification resists toward airborne contamination is described, which is based on our observation that glass transition temperatures (Tg) primarily govern the absorption of N-methylpyrrolidone (NMP)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7ade53e5e0f200d456907ce38480b262
https://doi.org/10.2494/photopolymer.6.547
https://doi.org/10.2494/photopolymer.6.547
Autor:
Gregory M. Wallraff, Gregory Breyta, Karen Petrillo, Dario Gil, W. Pierson, Carl E. Larson, Dolores C. Miller, Linda K. Sundberg
Publikováno v:
SPIE Proceedings.
The interaction of water with the photoresist film stack is proving to be a key factor in the current generation of 193-nm immersion lithography. Photoresist performance, CD control, optics lifetime, defectivity, overlay and possibly even tool throug
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5f9a198960e5fa58a58a5d58f9d0c524
https://doi.org/10.1117/12.657179
https://doi.org/10.1117/12.657179
Autor:
Eric F. Connor, Kaushal Patel, Thomas I. Wallow, Linda K. Sundberg, Phillip J. Brock, Gregory Breyta, Pushkara Rao Varanasi, Robert D. Allen, Blake Davis, Carl E. Larson, Ratnam Sooriyakumaran, Richard Anthony DiPietro
Publikováno v:
SPIE Proceedings.
Development of 193-nm negative resists that meet the stringent performance requirements of sub-100 nm resolution with conventional 0.26 N TMAH developer has proven to be a significant challenge. Most of the systems that are currently under developmen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ead371b1a000ec2d9ad9ec23ecc88fff
https://doi.org/10.1117/12.536432
https://doi.org/10.1117/12.536432
Autor:
Masaki Okazaki, Hiroshi Ito, Gregory Breyta, Hoa D. Truong, Nicolette Fender, Gregory M. Wallraff, Dolores C. Miller, Phillip J. Brock, Carl E. Larson, Robert D. Allen
Publikováno v:
SPIE Proceedings.
Our primary platform for 157 nm positive resists is built on a copolymer of t-butyl 2-trifluoromethylacrylate (TBTFMA) andnorbornene bearing hexafluoroisopropanol (NBHFA) as an acid group, which is prepared by radical copolymerization. Theradical cop
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3793cf90fe81a2d2cbf5615a53e83aa7
https://doi.org/10.1117/12.474223
https://doi.org/10.1117/12.474223
Publikováno v:
SPIE Proceedings.
Over the years for enhanced resolution, electron beam exposure tools have migrated to higher accelerating potentials. High kV exposure requires faster resist to offset the loss of absorbed radiation. In addition, in order to maintain throughput in ma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7a3d77065e00e981e2a322281440c004
https://doi.org/10.1117/12.474243
https://doi.org/10.1117/12.474243