Zobrazeno 1 - 10
of 51
pro vyhledávání: '"Gregory A. Hebner"'
Autor:
Gregory G. Howes, Scott D. Baalrud, Mark J. Kushner, Philip J. Morrison, Fred Skiff, Gianluca Gregori, Uri Shumlak, Forrest Doss, James M. Stone, George Tynan, Julia M. Mikhailova, Gennady Shvets, John Goree, Karl Krushelnick, Ellen G. Zweibel, David B. Graves, Cary Forest, Dmitri Ryutov, Troy Carter, Anne White, Stuart D. Bale, Alain J. Brizard, Thomas Killian, Igor Kaganovich, Edward Thomas, Chan Joshi, Michael Keidar, Alla S. Safronova, Jérôme Daligault, Jonathan Wurtele, André Anders, Nathaniel J. Fisch, Garudas Ganguli, William Heidbrink, Jeffrey Hopwood, Siegfried Glenzer, Robert E. Rudd, Vladimir Shiltsev, J. S. Sarff, Martin Laming, Bruce Remington, Michael E. Mauel, James Drake, Dustin Froula, Thomas Schenkel, Randall K. Smith, Igor Adamovich, Jorge J. Rocca, R. Paul Drake, D. Q. Lamb, J. R. Danielson, Matthew W. Kunz, Daniel Sinars, Michael Bonitz, S. Peter Gary, Stewart J. Zweben, Gregory A. Hebner, John R. Cary
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7444d862540e6103e6d69d9a50b0748c
https://doi.org/10.2172/1615243
https://doi.org/10.2172/1615243
Autor:
Edward P. Hammond, Edward V. Barnat, John Holland, Paul A. Miller, Theodoros Panagopoulos, Gregory A. Hebner, Alex Paterson
Publikováno v:
Plasma Sources Science and Technology. 16:330-336
The spatial structure and temporal evolution of the electric fields in a sheath formed in a dual frequency, 300 mm capacitive argon discharge are measured as functions of relative mixing between a low frequency current and a high frequency current. I
Publikováno v:
Plasma Sources Science and Technology. 15:879-888
Argon plasma characteristics in a dual-frequency, capacitively coupled, 300 mm-wafer plasma processing system were investigated for rf drive frequencies between 10 and 190 MHz. We report spatial and frequency dependent changes in plasma parameters su
Publikováno v:
Plasma Sources Science and Technology. 15:889-899
There is much interest in scaling rf-excited capacitively coupled plasma reactors to larger sizes and to higher frequencies. As the size approaches operating wavelength, concerns arise about non-uniformity across the work piece, particularly in light
Publikováno v:
Journal of Applied Physics. 92:6998-7007
The chemistry of high-density SF6 plasma discharges is not well characterized. In this article, a combination of computational modeling and experimental diagnostics has been utilized to understand charged species dynamics in an inductively coupled Ar
Publikováno v:
Journal of Applied Physics. 92:6451-6460
Dust particle transport in low-temperature plasmas has received considerable attention due to the desire to minimize contamination of wafers during plasma processing of microelectronic devices and for their use to study nonideal plasmas. Dust particl
Autor:
Paul A. Miller, Gregory A. Hebner
Publikováno v:
Journal of Applied Physics. 87:8304-8315
Laser induced fluorescence has been used to measure the spatial distribution of the two lowest energy argon excited states, 1s5 and 1s4, in inductively driven plasmas containing argon, chlorine and boron trichloride. The behavior of the two energy le
Autor:
Gregory A. Hebner, Paul A. Miller
Publikováno v:
Journal of Applied Physics. 87:7660-7666
Electron and negative ion densities have been measured in inductively coupled discharges containing C{sub 2}F{sub 6} and CHF{sub 3}. Line integrated electron density was determined using a microwave interferometer, negative ion densities were inferre