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pro vyhledávání: '"Gregg Shin"'
Autor:
Chidi Chidambaram, Tae Park, Gregg Shin, Christopher L. Borst, Tamba Tugbawa, Duane S. Boning
Publikováno v:
Journal of The Electrochemical Society. 151:C418
In this paper, a methodology for the characterization and modeling of pattern-dependent problems in copper interconnect topography is presented. For the electroplating process, the methodology consists of test structure and mask design to examine fea