Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Gratiela Isai"'
Autor:
Kan Zhou, Xin Guo, Yuyang Bian, Wenzhan Zhou, Yu Zhang, Ijen van Mil, Elly Shi, Robbin Zhu, Jo Zhu, Ivan Mao, Elvira Koolen, Kaiyuan Chi, Jose Carlos Font Trinchant, Gratiela Isai, Selena Chen, Jing Wang, Pei Wang, Shane Su, Xuechen Zhu, Kolos Lin, Kelvin Pao, Koen Thuijs, Peja Lee, Abdalmohsen Elmalk, Sudharshanan Raghunathan, Andy Zhang, Leon Liang, Xander Wang, Gary Zhang
Publikováno v:
2021 International Workshop on Advanced Patterning Solutions (IWAPS).
Autor:
Seung-Uk Jeong, Sotirios Tsiachris, Jeongwoo Jae, Dongyoung Lee, Chih-Hung Hsieh, Gwang-Gon Kim, Yuna Park, Ji-Hoon Jung, Kyoyeon Cho, Abdalmohsen Elmalk, Chanha Park, Nang-Lyeom Oh, Taekwon Jee, Gratiela Isai, Jungchan Kim, JaeYoung Park, Won-Kwang Ma, Ewa Kasperkiewicz, Rizvi Rahman, Anita Bouma, Sang Ho Lee, WeiTai Lin, Kuo-Feng Pao, Jae-Doug Yoo, Jonggeun Won, Sudharshanan Raghunathan, Hsin-Yu Chen, Kuan-Ming Chen, Sang-Woo Kim, Wolfgang Henke
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
In this paper, budget characterization and wafer mapping of the Edge Placement Error (EPE) is studied to manage and improve pattern defects with a use case selected from SK Hynix’s most advanced DRAM 1x nm product. To quantify EPE, CD and overlay w
Autor:
Amine Lakcher, Gunwoong Lee, Geert Vinken, Ahmed Zayed, Ruxandra Mustata, Jay Jung, Beomki Shin, Arno van den Brink, Mohamed El Kodadi, Paul Böcker, Soo Kyung Lee, Jeongsu Park, Gratiela Isai, Taeddy Kim, Jan-Pieter van Delft, Sangjun Han, Yong-Sik Shin, Chanha Park, Jennifer Shumway
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
The market transition from 2D to 3D-NAND in recent years requires strict focus control and monitoring solutions. ASML’s μDBF targets (micro Diffraction Based Focus) enable on-product focus measurement which can be used to optimize scanner correcti
Autor:
Youn-Tak Park, Ki-Yeop Park, Seung-chul Oh, Gratiela Isai, Hoyoung Kang, Peter van Oorschot, Stuart Young, Young-Hong Min, Khalid Elbattay, Sung-Goo Hong
Publikováno v:
SPIE Proceedings.
The imaging performances of XY linear and TE Azimuthal polarization were compared by thin mask approximation and rigorous 3D mask simulation. The simulations were performed for 40nm and 44nm half pitch patterns with a hyper NA (1.35) system. Each pol
Publikováno v:
Journal of the Electrochemical Society, 155(2), G21-G28. The Electrochemical Society Inc.
As the semiconductor industry strives toward wafer postprocessing and three-dimensional integration, a demand has arisen for high-quality thin films deposited at temperatures below 400°C. In this work, we present SiO2 films deposited at near room te
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::650a177b3f1d79831963b8807669d84e
https://research.utwente.nl/en/publications/89188025-77db-4fc4-a256-62bd6269ccef
https://research.utwente.nl/en/publications/89188025-77db-4fc4-a256-62bd6269ccef