Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Grant T, Hill"'
Publikováno v:
Proceedings of the National Academy of Sciences of the United States of America. 119(31)
The lithium supply issue mainly lies in the inability of current mining methods to access lithium sources of dilute concentrations and complex chemistry. Electrochemical intercalation has emerged as a highly selective method for lithium extraction; h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::073ae17233063c4194b7c6e33b865d79
https://pubmed.ncbi.nlm.nih.gov/35878020
https://pubmed.ncbi.nlm.nih.gov/35878020
Publikováno v:
Matter. 4:1611-1624
Summary Designing materials with high Li to Na selectivity is the key for direct extraction of Li from unconventional sources, such as seawater, without complex separations. However, material discovery is hindered by an insufficient understanding on
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::43fe7f842da9b3c4cf8eb7adcf401e9e
https://doi.org/10.1016/j.matt.2021.02.005
https://doi.org/10.1016/j.matt.2021.02.005
Publikováno v:
Molecular Systems Design & Engineering. 6:25-51
Electrochemical deionization technologies allow generation of potable water from contaminated sources and extraction of valuable resources from seawater, brines and industrial wastewater—all in an environmentally friendly and energy efficient manne
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e17e4c45bcdc8d30061bb1eac721073e
https://doi.org/10.1039/d0me00090f
https://doi.org/10.1039/d0me00090f
Autor:
Erinn C. Dandley, Gregory N. Parsons, Grant T. Hill, Craig D. Needham, Dennis T. Lee, Philip S. Williams, Christopher J. Oldham
Publikováno v:
The Journal of Physical Chemistry C. 123:16146-16152
The sequential vapor infiltration (SVI) method, based on atomic layer deposition chemistry, allows the creation of a polymer–inorganic hybrid material through the diffusion of metal–organic vapor reagents into a polymer substrate. This study inve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::42ede6f525db81f2687c639f1b28ccb8
https://doi.org/10.1021/acs.jpcc.9b02153
https://doi.org/10.1021/acs.jpcc.9b02153
Autor:
James S. Daubert, Jennifer S. Ovental, Philip S. Williams, Hannah N. Gotsch, Christopher J. Oldham, Grant T. Hill, Antoine P. Gremaud, Gregory N. Parsons
Publikováno v:
ACS Applied Materials & Interfaces. 9:4192-4201
Atomic layer deposition (ALD) is a viable means to add corrosion protection to copper metal. Ultrathin films of Al2O3, TiO2, ZnO, HfO2, and ZrO2 were deposited on copper metal using ALD, and their corrosion protection properties were measured using e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c644f8a52582454c1e1c74b60c567b06
https://doi.org/10.1021/acsami.6b13571
https://doi.org/10.1021/acsami.6b13571
Autor:
James S, Daubert, Grant T, Hill, Hannah N, Gotsch, Antoine P, Gremaud, Jennifer S, Ovental, Philip S, Williams, Christopher J, Oldham, Gregory N, Parsons
Publikováno v:
ACS applied materialsinterfaces. 9(4)
Atomic layer deposition (ALD) is a viable means to add corrosion protection to copper metal. Ultrathin films of Al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::11131da95c0c960c92e89272f050b5ee
https://pubmed.ncbi.nlm.nih.gov/28098440
https://pubmed.ncbi.nlm.nih.gov/28098440