Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Grainne Duffy"'
Autor:
Grainne Duffy
Publikováno v:
Journal of Physics B: Atomic, Molecular and Optical Physics. 35:L119-L126
The Ca I-like spectrum of doubly ionized titanium, Ti III, has been investigated by using the dual laser plasma technique. The 3d photoabsorption spectrum of Ti III has been recorded in the 17-27 eV region. It was found that single-electron transitio
Autor:
Grainne Duffy, Padraig Dunne
Publikováno v:
Journal of Physics B: Atomic, Molecular and Optical Physics. 34:L173-L178
The photoabsorption spectrum of In II has been recorded in the 18-33 eV region using the dual laser plasma (DLP) technique. Transitions from the 4d105s2 ground state dominate the In II spectrum with some contribution from the metastable 3P2, 3P1 and
Autor:
M Wang, Filip Heijkenskjöld, Fergal O'Reilly, Ronan Faulkner, Reinhold Hallin, Grainne Duffy, Arne Arnesen, J. Manrique, Padraig Dunne, Gerard O'Sullivan
Publikováno v:
Journal of Physics B: Atomic, Molecular and Optical Physics. 32:5299-5309
An analysis of potassium-like Ni X in the 15-170 nm wavelength region is reported following observations involving collision-based spectroscopy and laser plasma spectroscopy. Forty five transitions from different excited states in Ni X are identified
Autor:
Aldrice Bakouboula, Peter Choi, S. V. Zakharov, Keith Powell, Otman Benali, Wafa Kezzar, V. S. Zakharov, Jeremy Bastide, Edmund Wyndham, Grainne Duffy, Michèle Cau, R. Aliaga-Rossel, Clement Zaepffel, Blair Lebert, Ouassima Sarroukh, Philippe Bove, Luc Tantart
Publikováno v:
SPIE Proceedings.
EUV sources for actinic mask metrology, particularly for defect inspection, require extremely high brightness. The selfabsorption of radiation limits the in-band EUV radiance of the source plasma and makes it difficult to attain the necessary brightn
We report electromagnetically induced transparency for the D1 and D2 lines in $^{6}$Li in both a vapour cell and an atomic beam. Electromagnetically induced transparency is created using co-propagating mutually coherent laser beams with a frequency d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7c3d8106337a8f87bcab1e81eace1d09
Publikováno v:
SPIE Proceedings.
The internationally agreed semiconductor roadmap calls for the development of bright, narrow bandwidth sources of extreme UV radiation for lithography at 13.5 nm. Both pulsed discharge sources and laser produced plasmas have been proposed as possible
Autor:
Peter Choi, Grainne Duffy, Aldrice Bakouboula, Osamu Iwase, R. Aliaga-Rossel, S. V. Zakharov, Ouassima Sarroukh, Clement Zaepffel, Blair Lebert, Otman Benali, Keith Powell, Philippe Bove, Michèle Cau, V. S. Zakharov
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 11:021107-1
Actinic mask defect inspection and metrology requires high-brightness extreme-ultraviolet (EUV) sources. The self-absorption of radiation limits the in-band EUV radiance of the source plasma and makes it difficult to attain the necessary brightness a