Investigation of Ni catalyst activation during plasma-assisted methane oxidation

Autor: Yudong Li, Michael Hinshelwood, Gottlieb S Oehrlein

Publikováno v: Journal of Physics D: Applied Physics. 55:155202

Atmospheric pressure plasma has shown promise in improving thermally activated catalytic reactions through a process termed plasma-catalysis synergy. In this work, we investigated atmospheric pressure plasma jet (APPJ)-assisted CH4 oxidation over a N

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::11388452447e2525e270b03b1f7719bb
https://doi.org/10.1088/1361-6463/ac4724

Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective

Autor: Sang-wuk Park, Keizo Kinoshita, Kenji Ishikawa, Silvia Armini, Gottlieb S. Oehrlein, Tatsuru Shirafuji, Keren J. Kanarik, Yasuhiro Morikawa, Richard A. Gottscho, Hisataka Hayashi, Tatsuo Ishijima, Nathan P. Marchack, Gert J. Leusink, Emilie Despiau-Pujo, Takahide Murayama

Publikováno v: Japanese Journal of Applied Physics
Japanese Journal of Applied Physics, Japan Society of Applied Physics, 2019, 58 (SE), pp.SE0801. ⟨10.7567/1347-4065/ab163e⟩
Japanese Journal of Applied Physics, 2019, 58 (SE), pp.SE0801. ⟨10.7567/1347-4065/ab163e⟩

International audience

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bca17bb5242eaeeee079b4e77984bcef
https://hal.univ-grenoble-alpes.fr/hal-02337524

Characterization of Ultrathin Polymer Films Using p-Polarized ATR-FTIR and Its Comparison with XPS

Autor: Pingshan Luan, Gottlieb S. Oehrlein

Publikováno v: Langmuir : the ACS journal of surfaces and colloids. 35(12)

We report on the chemical analysis of ultrathin (10 nm) polymer films using the attenuated total reflectance-Fourier transform infrared (ATR-FTIR) technique based on p-polarized infrared light and two types of enhancing substrates, that is, metallic

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::da730227acb225ef4d4a0dd5b5579806
https://pubmed.ncbi.nlm.nih.gov/30840470

Cold Atmospheric Pressure Plasma VUV Interactions With Surfaces: Effect of Local Gas Environment and Source Design

Autor: Peter Bruggeman, Pingshan Luan, Andrew J. Knoll, Elliot A. J. Bartis, Gottlieb S. Oehrlein, V. S.S.K. Kondeti

Publikováno v: Plasma Processes and Polymers. 13:1069-1079

This study uses photoresist materials in combination with several optical filters as a diagnostic to examine the relative importance of VUV-induced surface modifications for different cold atmospheric pressure plasma (CAPP) sources. The argon fed kHz

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::54dd63ff2dec003aff2d16a3ef4f7d6a
https://doi.org/10.1002/ppap.201600043

Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etching

Autor: Klaus Edinger, Gottlieb S. Oehrlein, Chen Li, Thorsten Hofmann, Valery Godyak

Publikováno v: Journal of Vacuum Science & Technology A. 38:033001

A material etching system was developed by combining beam electron injection from a direct current hollow cathode (HC) electron source with the downstream reactive environment of a remote CF4/O2 low temperature plasma. The energy of the injected beam

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::304d92b1d5b2730777539031ea3cbec7
https://doi.org/10.1116/1.5143537