Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Gota Niimi"'
Autor:
Eiki Hotta, Masato Watanabe, Takanori Komatsu, Inho Song, Yusuke Sakai, Akitoshi Okino, Yifan Xiao, Gota Niimi
Publikováno v:
Scopus-Elsevier
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4ff22b005f0fd3adf98f0ef9476a12cb
https://doi.org/10.1541/ieejfms.127.675
https://doi.org/10.1541/ieejfms.127.675
Autor:
Margarete Kops, Kiyotada Nakamura, Gota Niimi, B Santos, Ralf Kops, Yusuke Teramoto, Takuma Yokoyama, Takahiro Shirai, Noritaka Ashizawa, Guido Mertens, Hiroto Sato, Hironobu Yabuta, Kunihiko Kasama, Felix Küpper, Akihisa Nagano, Masaki Yoshioka
Publikováno v:
SPIE Proceedings.
Actinic mask inspection manufactures are currently searching for high-radiance EUV sources for their tools. LDP source, which was previously used for lithography purposes, was found to be a good candidate as it can provide sufficient power and radian
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f42282ce848c34cdcadfc66632c037d9
https://doi.org/10.1117/12.2046423
https://doi.org/10.1117/12.2046423
Publikováno v:
SPIE Proceedings.
For industrial EUV (extreme ultra-violet) lithography applications high power EUV light sources are needed at a central wavelength of 13.5 nm. Philips Extreme UV GmbH, EUVA and XTREME technologies GmbH have jointly developed tin DPP (Discharge Produc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f3bca42091f99cba9eabb23bed6b5b3
https://doi.org/10.1117/12.846545
https://doi.org/10.1117/12.846545