Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Gonzalo Antonio Monroy"'
Autor:
Ankur Agarwal, Gonzalo Antonio Monroy, Kenneth S. Collins, Ying Zhang, Kartik Ramaswamy, Leonid Dorf, J. C. Wang, Jason A. Kenney, Shahid Rauf
Publikováno v:
Journal of Physics D: Applied Physics. 50:274003
There has been a steady increase in sub-nm precision requirement for many critical plasma etching processes in the semiconductor industry. In addition to high selectivity and low controllable etch rate, an important requirement of atomic precision et
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::791762ced68e6d9891c6a2aaad5d80a4
https://doi.org/10.1088/1361-6463/aa7357
https://doi.org/10.1088/1361-6463/aa7357
Autor:
Kenneth S. Collins, Gonzalo Antonio Monroy, Ming-Feng Wu, Leonid Dorf, Shahid Rauf, Sergey G. Belostotskiy
Publikováno v:
IEEE Transactions on Plasma Science. 42:2584-2585
Immersing a hollow cathode into a magnetic field enhances trapping of fast cathode electrons and ionization, providing ~30% decrease in the discharge voltage for a given current. The nonuniform magnetic field in our electron source causes an intricat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f38493f28d27c433590af0a148164242
https://doi.org/10.1109/tps.2014.2351409
https://doi.org/10.1109/tps.2014.2351409