Surface loss rates of H and Cl atoms in an inductively coupled plasma etcher using time-resolved electron density and optical emission measurements

Autor: Curley, G. A., GATILOVA, L., Guilet, S., Bouchoule, S., Gogna, G. S., Sirse, Nishant, KARKARI, S., Booth, Jean-Paul

Publikováno v: Journal of Vacuum Science and Technology A
Journal of Vacuum Science and Technology A, 2010, 28 (2), pp.360-372. ⟨10.1116/1.3330766⟩
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A, 2010, 28 (2), pp.360-372. ⟨10.1116/1.3330766⟩

International audience; A study is undertaken of the loss kinetics of H and Cl atoms in an inductively coupled plasma (ICP) reactor used for the etching of III-V semiconductor materials. A time-resolved optical emission spectroscopy technique, also r

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::0ac1fb992e17bf783cbad6199b0b4d40
https://hal.archives-ouvertes.fr/hal-01549465

Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.

Performance of a Floating Hairpin Probe in Strongly Magnetized Plasma.

Autor: Karkari, S. K., Gogna, G. S., Boilson, D., Turner, M. M., Simonin, A.

Publikováno v: Contributions to Plasma Physics; Sep2010, Vol. 50 Issue 9, p903-908, 6p