Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Go Ichinose"'
Autor:
Peter A. Leitl, Dominik Kohl, Hirokazu Tsuchihashi, Richard Gruber, Karl Pichler, Yuta Goto, Mikel L. Garcia de Albeniz, Kaneyuki Naito, Andreas Flanschger, Go Ichinose
Publikováno v:
AIAA SCITECH 2023 Forum.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dec51fbf56ea784dbff450d427e8d4b3
https://doi.org/10.2514/6.2023-1765
https://doi.org/10.2514/6.2023-1765
Autor:
Peter A. Leitl, Masayuki Shiraishi, Andreas Flanschger, Shintaro Tsuchihashi, Andeas Marn, Stefan Schreck, Go Ichinose, Yuichi Shibazaki, Richard Benauer, Simon Pramstrahler
Publikováno v:
AIAA SCITECH 2022 Forum.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b3a80e1f571fa5e456f6f04de252b62
https://doi.org/10.2514/6.2022-0917
https://doi.org/10.2514/6.2022-0917
Autor:
Yuichi Shibazaki, Hajime Yamamoto, Tomonori Dosho, Yujiro Hikida, Masahiro Morita, Yuji Shiba, Jay Brown, Takanobu Okamoto, Go Ichinose
Publikováno v:
SPIE Proceedings.
The final lithography accuracy is determined by what is known as the “on-product” performance, which includes product wafer-related errors and long-term stability. It is evident that on-product performance improvement is absolutely imperative now
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e5aaf60a3814420f7238cf9017e9194
https://doi.org/10.1117/12.2257659
https://doi.org/10.1117/12.2257659