Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Gnanavel Vaidhyanathan Krishnamurthy"'
Autor:
Gnanavel Vaidhyanathan Krishnamurthy, Manohar Chirumamilla, Surya Snata Rout, Kaline P. Furlan, Tobias Krekeler, Martin Ritter, Hans-Werner Becker, Alexander Yu Petrov, Manfred Eich, Michael Störmer
Publikováno v:
Scientific Reports, Vol 11, Iss 1, Pp 1-12 (2021)
Abstract The high-temperature stability of thermal emitters is one of the critical properties of thermophotovoltaic (TPV) systems to obtain high radiative power and conversion efficiencies. W and HfO2 are ideal due to their high melting points and lo
Externí odkaz:
https://doaj.org/article/f68b42314a7c4beb906fa0046e953680
Autor:
Manohar Chirumamilla, Gnanavel Vaidhyanathan Krishnamurthy, Katrin Knopp, Tobias Krekeler, Matthias Graf, Dirk Jalas, Martin Ritter, Michael Störmer, Alexander Yu Petrov, Manfred Eich
Publikováno v:
Scientific Reports, Vol 9, Iss 1, Pp 1-11 (2019)
Abstract High temperature stable selective emitters can significantly increase efficiency and radiative power in thermophotovoltaic (TPV) systems. However, optical properties of structured emitters reported so far degrade at temperatures approaching
Externí odkaz:
https://doaj.org/article/065a0eaa0973406fb5364bc0a135153b
Autor:
Martin Ritter, Duncan S. Sutherland, Gnanavel Vaidhyanathan Krishnamurthy, Alexander Petrov, Kjeld Møller Pedersen, S. S. Rout, Manohar Chirumamilla, Sergey I. Bozhevolnyi, Ankita Ganguly, Manfred Eich, Tobias Krekeler, Mahima Arya, Michael Störmer
Publikováno v:
Krekeler, T, Rout, S S, Krishnamurthy, G V, Störmer, M, Arya, M, Ganguly, A, Sutherland, D S, Bozhevolnyi, S I, Ritter, M, Pedersen, K, Petrov, A Y, Eich, M & Chirumamilla, M 2021, ' Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Krekeler, T.; Rout, S.S.; Krishnamurthy, G.V.; Störmer, M.; Arya, M.; Ganguly, A.; Sutherland, D.S.; Bozhevolnyi, S.I.; Ritter, M.; Pedersen, K.; Petrov, A.Y.; Eich, M.; Chirumamilla, M.: Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C. In: Advanced Optical Materials. Vol. 9 (2021) 16, 2100323. (DOI: /10.1002/adom.202100323)
Krekeler, T, S. Rout, S, V. Krishnamurthy, G, Störmer, M, Arya, M, Ganguly, A, S. Sutherland, D, i. Bozhevolnyi, S, Ritter, M, Pedersen, K, Yu Petrov, A, Eich, M & Chirumamilla, M 2021, ' Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Krekeler, T, Rout, S S, Krishnamurthy, G V, Störmer, M, Arya, M, Ganguly, A, Sutherland, D S, Bozhevolnyi, S I, Ritter, M, Pedersen, K, Petrov, A Y, Eich, M & Chirumamilla, M 2021, ' Unprecedented thermal stability of plasmonic titanium nitride films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Advanced Optical Materials 9 (16): 2100323 (2021-08-18)
Krekeler, T.; Rout, S.S.; Krishnamurthy, G.V.; Störmer, M.; Arya, M.; Ganguly, A.; Sutherland, D.S.; Bozhevolnyi, S.I.; Ritter, M.; Pedersen, K.; Petrov, A.Y.; Eich, M.; Chirumamilla, M.: Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C. In: Advanced Optical Materials. Vol. 9 (2021) 16, 2100323. (DOI: /10.1002/adom.202100323)
Krekeler, T, S. Rout, S, V. Krishnamurthy, G, Störmer, M, Arya, M, Ganguly, A, S. Sutherland, D, i. Bozhevolnyi, S, Ritter, M, Pedersen, K, Yu Petrov, A, Eich, M & Chirumamilla, M 2021, ' Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Krekeler, T, Rout, S S, Krishnamurthy, G V, Störmer, M, Arya, M, Ganguly, A, Sutherland, D S, Bozhevolnyi, S I, Ritter, M, Pedersen, K, Petrov, A Y, Eich, M & Chirumamilla, M 2021, ' Unprecedented thermal stability of plasmonic titanium nitride films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Advanced Optical Materials 9 (16): 2100323 (2021-08-18)
Titanium nitride (TiN) has emerged as one of the most promising refractory materials for plasmonic and photonic applications at high temperatures due to its prominent optical properties along with mechanical and thermal stability. From a high tempera
Autor:
Gnanavel Vaidhyanathan Krishnamurthy, Michael Störmer, Mahima Arya, Alexander Yu. Petrov, Manohar Chirumamilla, S. S. Rout, Ankita Ganguly, Martin Ritter, Manfred Eich, Tobias Krekeler
Publikováno v:
Technische Universität Hamburg
We measure and compare the optical properties of thin refractory metal films (TiN, W, Mo and Ir) at temperatures up to 1000 °C. In-situ ellipsometry is used to measure the optical constants. Refractory metals show long-term structural stability at 1
Autor:
S. S. Rout, Manfred Eich, Tobias Krekeler, Kaline Pagnan Furlan, Gnanavel Vaidhyanathan Krishnamurthy, Michael Störmer, Hans Werner Becker, Manohar Chirumamilla, Martin Ritter, Alexander Petrov
Publikováno v:
Scientific Reports
Scientific Reports, Vol 11, Iss 1, Pp 1-12 (2021)
Scientific Reports 11 (1): 3330 (2021-02-08)
Krishnamurthy, G.V.; Chirumamilla, M.; Snata Rout, S.; P. Furlan, K.; Krekeler, T.; Ritter, M.; Becker, H.; Petrov, A.; Eich, M.; Störmer, M.: Structural degradation of tungsten sandwiched in hafnia layers determined by in-situ XRD up to 1520 °C. In: Scientific Reports. Vol. 11 (2021) 1, 3330 . (DOI: /10.1038/s41598-021-82821-0)
Scientific Reports, Vol 11, Iss 1, Pp 1-12 (2021)
Scientific Reports 11 (1): 3330 (2021-02-08)
Krishnamurthy, G.V.; Chirumamilla, M.; Snata Rout, S.; P. Furlan, K.; Krekeler, T.; Ritter, M.; Becker, H.; Petrov, A.; Eich, M.; Störmer, M.: Structural degradation of tungsten sandwiched in hafnia layers determined by in-situ XRD up to 1520 °C. In: Scientific Reports. Vol. 11 (2021) 1, 3330 . (DOI: /10.1038/s41598-021-82821-0)
The high-temperature stability of thermal emitters is one of the critical properties of thermophotovoltaic (TPV) systems to obtain high radiative power and conversion efficiencies. W and HfO2 are ideal due to their high melting points and low vapor p
Autor:
Gnanavel Vaidhyanathan Krishnamurthy, Niklas Wolff, A. Petraru, Lorenz Kienle, Hermann Kohlstedt, Bernhard Wagner, Simon Fichtner, Fabian Lofink, Sascha Bohse, Steffen Chemnitz
Publikováno v:
Journal of Applied Physics. 122:035301
Enhancing the piezoelectric activity of AlN by partially substituting Al with Sc to form Al1-xScxN is a promising approach to improve the performance of piezoelectric micro-electromechanical systems. Here, we present evidence of an instability in the