Zobrazeno 1 - 10
of 89
pro vyhledávání: '"Glenn D. Kubiak"'
Autor:
Karen L. Jefferson, William C. Replogle, David Attwood, Donald W. Sweeney, Layton C. Hale, Donna J. O'Connell, Leonard E. Klebanoff, Alvin H. Leung, John B. Wronosky, Henry N. Chapman, Daniel A. Tichenor, Patrick P. Naulleau, Sang H. Lee, Glenn D. Kubiak, Kenneth A. Goldberg, James A. Folta, John S. Taylor, W. P. Ballard, Richard H. Stulen, John E. M. Goldsmith
Publikováno v:
Journal of Photopolymer Science and Technology. 15:351-360
The EUV Engineering Test Stand (ETS) has demonstrated the printing of static and scanned 100nm dense features. This milestone was first achieved in 2001 with a developmental set of projection optics (P0 Box 1) and with a low power LPP source (40W dri
Publikováno v:
Journal of Applied Physics. 90:3726-3734
Laser produced plasmas (LPPs) provide a stable source of extreme ultraviolet (EUV) light making them well suited for use in next-generation lithography tools. The plasma is generated by directing a laser at a target composed of a partially condensed
Publikováno v:
Journal of Applied Physics. 77:3484-3490
Temperature programmed desorption was used to measure the desorption kinetics of hydrogen and its isotopes from chemical vapor deposited diamond surfaces. The desorption spectra are surprisingly simple considering the polycrystalline nature of the sa
Autor:
Richard E. Olson, Dennis Grady, Timothy G. Trucano, Glenn D. Kubiak, A. V. Farnsworth, Marlin E. Kipp
Publikováno v:
International Journal of Impact Engineering. 17:873-890
E xtreme U ltra V iolet L ithography (EUVL) seeks to apply radiation in a wavelength region centered near 13 nm to produce microcircuits having feature sizes 0.1 micron or less. A critical requirement for the commercial application of this technology
Autor:
Craig H. Boyce, Glenn D. Kubiak, A.A. MacDowell, B. La Fontaine, R. S. Hutton, D.R. Wheeler, Obert R. Wood, Gary N. Taylor, Susan M. Stein
Publikováno v:
Microelectronic Engineering. 23:279-282
Advances in silylation materials, a bilayer resist scheme and innovative processing at each processing step have afforded optimum resolution with Shipley XP-8844 positive resist. In a bilayer resist version 0.2μm l/s were resolved by DUV exposure, w
The Engineering Test Stand (ETS) is a fully integrated, alpha-class, full-field (24 × 32 mm) EUVL step-scan tool that was developed for system and process learning in support of commercialization of EUVL. The overall system design is shown in Fig. 2
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bcc762e33363c155478593b1b42ae92e
https://doi.org/10.1117/3.613774.ch24
https://doi.org/10.1117/3.613774.ch24
Autor:
Obert R. Wood, William C. Sweatt, Kurt W. Berger, W. K. Waskiewicz, Daniel A. Tichenor, Donald Lawrence White, Richard H. Stulen, Richard R. Freeman, Marc D. Himel, David L. Windt, Jeffrey Bokor, Steven J. Haney, John E. Bjorkholm, L. A. Brown, Glenn D. Kubiak, Donald M. Tennant, William M. Mansfield, Tanya E. Jewell, Alastair A. MacDowell, Michael E. Malinowski
Publikováno v:
Applied optics. 32(34)
Soft-x-ray projection imaging is demonstrated by the use of 14-nm radiation from a laser plasma source and a single-surface multilayer-coated ellipsoidal condenser. Aberrations in the condenser and the Schwarzschild imaging objective are characterize
Autor:
Glenn D. Kubiak, Katherine Early, D.Y. Jeon, Obert R. Wood, Alastair A. MacDowell, Daniel A. Tichenor, P. P. Mulgrew, Donald M. Tennant
Publikováno v:
Applied optics. 32(34)
Using 14-nm wavelength illumination, we have imaged 0.1-µm-wide lines and spaces in single-layer thin films of the highy sensitive, negative, chemically amplified resist AZ PN114 by usingboth a Schwarzschild 20× camera and an Offner ring field 1×
Autor:
Donald Lawrence White, Richard R. Freeman, Donald M. Tennant, William M. Mansfield, Michael E. Malinowski, Daniel A. Tichenor, L. A. Brown, Richard H. Stulen, Steven J. Haney, Kurt W. Berger, W. K. Waskiewicz, John E. Bjorkholm, Obert R. Wood, David L. Windt, Alastair A. MacDowell, Tanya E. Jewell, Glenn D. Kubiak, Jeffrey Bokor
Publikováno v:
Optics letters. 16(20)
Projection imaging of 0.1-microm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist
Autor:
William E. Seaman, Mark Hilary Van Benthem, Ryan Wesley Davis, Shawn Martin, Michael B. Sinclair, Allan Brasier, Jens Fredrich Poschet, Anup K. Singh, James Bryce Ricken, Steven S. Branda, Christopher A. Apblett, Steven J. Plimpton, Amanda Carroll-Portillo, Matthew W. Moorman, Howland D. T. Jones, Jaewook Joo, Julie Kaiser, K.L. Sale, James S. Brennan, Jean-Loup M. Faulon, Todd Lane, Daniel J. Throckmorton, Roberto Rebeil, Jaclyn K. Murton, Diane S. Lidke, Glenn D. Kubiak, Nimisha Srivastava, Catherine Branda, Elsa Ndiaye-Dulac, David M. Haaland, Elizabeth L. Carles, Thomas D. Perroud, Paul J. Gemperline, Bryan Carson, Zhaoduo Zhang, Anthony Martino, Ronald P Manginell, Ronald F. Renzi, Conrad D. James, Kamlesh D. Patel, Susan M. Brozik, Milind Misra, Meiye Wu, Amy Elizabeth Herr, Susan Rempe
The overarching goal is to develop novel technologies to elucidate molecular mechanisms of the innate immune response in host cells to pathogens such as bacteria and viruses including the mechanisms used by pathogens to subvert/suppress/obfuscate the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::80c0de7c74132e93d21cbed01838225d
https://doi.org/10.2172/976947
https://doi.org/10.2172/976947