Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Glen Mori"'
Publikováno v:
JMIR Formative Research, Vol 8, p e58241 (2024)
BackgroundOnline mental health communities (OMHCs) are an effective and accessible channel to give and receive social support for individuals with mental and emotional issues. However, a key challenge on these platforms is finding suitable partners t
Externí odkaz:
https://doaj.org/article/0c01679078fb43b5b722c0bd2cb429e9
Publikováno v:
The Pediatric Infectious Disease Journal. 16:619-622
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4516dc7b1a8dff8f5d52508d2e460e1c
https://doi.org/10.1097/00006454-199706000-00014
https://doi.org/10.1097/00006454-199706000-00014
Autor:
Hiram Cervera, Harry J. Levinson, Glen Mori, Thomas I. Wallow, Jongwook Kye, Charles R. Szmanda, Ryoung-han Kim, Junyan Dai, Nikolaos Bekiaris, Chi Truong
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
We describe progress in low-k 1 factor double patterning using 172 nm ultraviolet (UV) curing as a resist stabilization method. Factors that have contributed to enhanced patterning capability include a) resists design and optimization for both patter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5fb0790fa5e1d68623b060e292118329
https://doi.org/10.1117/12.814468
https://doi.org/10.1117/12.814468
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
This study reports on blob defect reduction and process impacts by Acid Rinse System. Blob defects that appear after develop are a common problem with i-line, KrF, ArF and ArF-immersion resists. Last year we reported Blob defects were influenced by t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30eaa6e5f9499b9e93ff836990d57cc3
https://doi.org/10.1117/12.813605
https://doi.org/10.1117/12.813605
Autor:
Joseph Kennedy, Songyuan Xie, Hiram Cervera, Ze-Yu Wu, Thomas Wallow, Junyan Dai, Kyle Flanigan, Nikolaos Bekiaris, Ron Katsanes, Glen Mori
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
As IC manufactures explore different paths to meet the resolution requirements for next generation technology, patterning schemes which utilize a double photoresist patterning process are under extensive evaluation. One dual patterning process under
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2057bdf8e29b3fc513d9947c07c32b4f
https://doi.org/10.1117/12.814416
https://doi.org/10.1117/12.814416
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
There is a limit to the minimum feature size that can be printed using current lithographic techniques. For that reason, engineers often employ various shrink methods in production to reduce the size of features generated by lithography. One such tec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::05f35bc68fb2c5ee7dbdb0f51d055b68
https://doi.org/10.1117/12.814359
https://doi.org/10.1117/12.814359