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of 56
pro vyhledávání: '"Glawar, Robert"'
Autor:
Jalali, Anahid, Heistracher, Clemens, Schindler, Alexander, Haslhofer, Bernhard, Nemeth, Tanja, Glawar, Robert, Sihn, Wilfried, De Boer, Peter
Predicting unscheduled breakdowns of plasma etching equipment can reduce maintenance costs and production losses in the semiconductor industry. However, plasma etching is a complex procedure and it is hard to capture all relevant equipment properties
Externí odkaz:
http://arxiv.org/abs/1904.07686
Publikováno v:
In Procedia CIRP 2023 118:1078-1083
Publikováno v:
In IFAC PapersOnLine 2022 55(10):2312-2317
Publikováno v:
In IFAC PapersOnLine 2022 55(10):2318-2323
Autor:
Reichsthaler, Luisa, Madreiter, Theresa, Giner, Jakob, Glawar, Robert, Ansari, Fazel, Sihn, Wilfried
Publikováno v:
In Procedia CIRP 2022 105:296-301
Publikováno v:
In IFAC PapersOnLine 2021 54(1):43-48
Autor:
Biebl, Fabian, Glawar, Robert, Jalali, Anahid, Ansari, Fazel, Haslhofer, Bernhard, Boer, Peter de, Sihn, Wilfried
Publikováno v:
In Procedia CIRP 2020 88:64-69
Publikováno v:
In Procedia CIRP 2019 81:938-943
Publikováno v:
In Procedia CIRP 2019 80:482-487
Publikováno v:
In Procedia Manufacturing 2018 23:111-116