Zobrazeno 1 - 10
of 72
pro vyhledávání: '"Gladfelter, W. L."'
Autor:
Li, M., Zhang, Z., Campbell, S. A., Gladfelter, W. L., Agustin, M. P., Klenov, D. O., Stemmer, S.
Publikováno v:
Journal of Applied Physics; 9/1/2005, Vol. 98 Issue 5, p054506, 8p, 3 Black and White Photographs, 2 Charts, 8 Graphs
Publikováno v:
Journal of Applied Physics; 9/15/1994, Vol. 76 Issue 6, p3471, 8p
Autor:
Constantin Vahlas, Caussat, B., Senocq, F., Gladfelter, W. L., Sarantopoulos, C., Toro, D., Moersch, T.
Publikováno v:
Scopus-Elsevier
Chemical vapor deposition (CVD) using precursors that are solids at operating temperatures and pressures, presents challenges due to their relatively low vapor pressures. In addition, the sublimation rates of solid state precursors in fixed bed react
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::097888dbb90fd7ca77c25a953b7b7bb4
https://oatao.univ-toulouse.fr/1287/
https://oatao.univ-toulouse.fr/1287/
Publikováno v:
MRS Online Proceedings Library; 1999, Vol. 606 Issue 1, p1-10, 10p
Autor:
Wells, R. L., Janik, J. F., Gladfelter, W. L., Coffer, J. L., Johnsons, M. A., Steffey, B. D.
Publikováno v:
MRS Online Proceedings Library; 1997, Vol. 468 Issue 1, p39-44, 6p
Publikováno v:
Chemical Vapor Deposition; Aug2007, Vol. 13 Issue 8, p381-388, 8p
Publikováno v:
Chemical Vapor Deposition; Mar2007, Vol. 13 Issue 2/3, p123-129, 7p
Publikováno v:
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; May2006, Vol. 24 Issue 3, p418-423, 6p, 11 Graphs
Autor:
Jia, Q. X., Findikoiglu, A. T., Zhou, R., Foltyn, S. R., Wu, X. D., Smith, J. L., Wang, Q., Evans, D. F., Gladfelter, W. L.
Publikováno v:
Integrated Ferroelectrics; Apr1998, Vol. 19 Issue 1-4, p111-119, 9p
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 3, p1706-1711, 6p