Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Giulia Spinolo"'
Autor:
Angelo Maspero, Silvia Ardizzone, Davide Gianni, Giulia Spinolo, Norberto Masciocchi, Damiano Monticelli, Giuseppe Cappelletti
Publikováno v:
MRS Proceedings. 991
Commercially-available WCMP slurries perform differently under diverse modifications: pH variations, dilutions, ageing, etc. In order to understand the physico-chemical basics of the mechanism and selectivity of these slurries, we have performed a nu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1cfeb8bcca54f5c631d099dde0752908
https://doi.org/10.1557/proc-0991-c09-04
https://doi.org/10.1557/proc-0991-c09-04
Autor:
Antonella Martin, Peter McKeever, Francesca Frigerio, Anand N. Iyer, Maurizio Bacchetta, Sonia Morin, Maurizio Tremolada, Giulia Spinolo, Benjamin A. Bonner
Publikováno v:
MRS Proceedings. 767
The development of a direct polish process for STI CMP on 200mm wafers using highselectivity slurry (HSS) has been achieved for production of 0.13μm technology microelectronic devices. The new process has improved on-wafer performance compared to st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ac3ddfed66ce4daa03d7231e36ae5c2
https://doi.org/10.1557/proc-767-f5.10
https://doi.org/10.1557/proc-767-f5.10