Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Gillian A. M. Reynolds"'
Autor:
Robert Joseph Bouchard, Paul Moffett, S. Ismat Shah, Howard Jones, Lap-Tak Cheng, Daniel Irwin Amey, Gillian A. M. Reynolds, Linda F. Robinson
Publikováno v:
Journal of Materials Research. 17:2590-2598
Ion bombardment was used to produce electron-emitting microscale features on surfaces of thick films printed with carbon pastes. This technology can potentially enable the development of large-area field emission displays. Systematic investigations u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dc2178f39c078e98eca108ef362ccaed
https://doi.org/10.1557/jmr.2002.0375
https://doi.org/10.1557/jmr.2002.0375
Publikováno v:
Physical Review B. 49:15027-15034
The photoconductivity and dark conductivity of carbon aerogels with various heat-treatment temperatures, [ital T][sub HT], and densities are studied. Unlike the trend for as-prepared samples, the magnitude of the photoconductivity for heat-treated ([
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::70e5f9be8e769c780ef3c072943e0037
https://doi.org/10.1103/physrevb.49.15027
https://doi.org/10.1103/physrevb.49.15027
Autor:
Roger H. French, Charlie C. Torardi, Laurent Dieu, M. F. Lemon, Gillian A. M. Reynolds, David J. Jones, C. R. Miao, Greg P. Hughes, L. Wilson, M. H. Reilly, Peter F. Carcia
Publikováno v:
Engineered Nanostructural Films and Materials.
Optical lithography is one of the key enabling technologies in semiconductor microcircuit fabrication. As the demand for devices with higher performance and speed continue, the need for patterning circuits with finer features is driving optical micro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f0ec39cf76543f75dc9d2a980893a855
https://doi.org/10.1117/12.351257
https://doi.org/10.1117/12.351257
Autor:
Roger H. French, David J. Jones, Charlie C. Torardi, M. F. Lemon, Greg P. Hughes, L. Wilson, M. H. Reilly, C. R. Miao, Gillian A. M. Reynolds, Peter F. Carcia
Publikováno v:
SPIE Proceedings.
We have developed a new attenuating embedded phase-shift mask blank for 193 nm lithography based on novel TiSi-nitride chemistry. At 193 nm, these materials offer high optical transmission, they are radiation damage resistant, stable in common chemic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4cbfb3696ba124486e98490fdd23e4cb
https://doi.org/10.1117/12.332857
https://doi.org/10.1117/12.332857
Publikováno v:
Physical review. B, Condensed matter. 41(2)
The elasticity tensor of a single-grain quasicrystal of composition ${\mathrm{Al}}_{5.1}$${\mathrm{CuLi}}_{3}$ has been determined. The longitudinal and transverse mode velocities have been obtained at ultrasonic frequencies (20 MHz) for several prop
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0938f16e5ee27307596acdbdbae539e5
https://pubmed.ncbi.nlm.nih.gov/9993817
https://pubmed.ncbi.nlm.nih.gov/9993817