Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Gilles Borsoni"'
Publikováno v:
Quantum Electronics. 47:32-37
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::23b98cd2a281fc9f670fa097fdef142a
https://doi.org/10.1070/qel16061
https://doi.org/10.1070/qel16061
Autor:
A. Alexandrov, Gilles Borsoni, P. Romanov, Vadim Samarkin, Julia Sheldakova, Alexis Kudryashov
Publikováno v:
2016 International Conference Laser Optics (LO).
Deformable mirrors with the size of 410×470 mm for high power lasers was developed. The results of the measurements of the response functions of all the actuators and of the surface shape of the deformable mirror are presented in this paper. The stu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8a4338f089c43257dcad19e90ee2987d
https://doi.org/10.1109/lo.2016.7549798
https://doi.org/10.1109/lo.2016.7549798
Publikováno v:
2016 International Conference Laser Optics (LO).
It is suggested to reconstruct the real-time atmospheric turbulence in the lab by means of the stacked-actuator deformable mirror and the bimorph deformable mirror. The characteristics of the spatial reconstruction are discussed. The phase screens in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a59968c534a448a36d774e36c477231
https://doi.org/10.1109/lo.2016.7549767
https://doi.org/10.1109/lo.2016.7549767
Autor:
Valerii Karasik, Alexander Nikitin, Alexey Sakharov, Alexis Kudryashov, Gilles Borsoni, Julia Sheldakova, D. G. Denisov
Publikováno v:
Photonic Instrumentation Engineering III.
In this paper we consider two approaches widely used in testing of wide aperture optics: Fizeau interferometer and Shack-Hartmann wavefront sensor. Fizeau interferometer that is common instrument in optical testing can be transformed to a device usin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e52e2e8be0f089d2ac8ca12ad0279ef6
https://doi.org/10.1117/12.2219282
https://doi.org/10.1117/12.2219282
Autor:
Vadim Samarkin, Alexis Kudryashov, Takahisa Jitsuno, Alexander Alexandrov, Pavel Romanov, Aleksei Rukosuev, Gilles Borsoni
Publikováno v:
High Power Laser Science and Engineering. 4
The deformable mirror with the size of $410~\text{mm}\times 468~\text{mm}$ controlled by the bimorph piezoceramic plates and multilayer piezoceramic stacks was developed. The results of the measurements of the response functions of all the actuators
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5f09cbeff624efc6db17089635b34447
https://doi.org/10.1017/hpl.2016.3
https://doi.org/10.1017/hpl.2016.3
Publikováno v:
SPIE Proceedings.
It is suggested to reconstruct the phase screens with the use of different deformable mirror types. In this work we present the results of the phase screen reproducing with the use of stacked-actuator deformable mirror and bimorph one. The reconstruc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5f1737867863fc46ac5ed6917a95e59
https://doi.org/10.1117/12.2194980
https://doi.org/10.1117/12.2194980
Publikováno v:
Unconventional Imaging and Wavefront Sensing 2015.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ca382c17b8fe554feba95c157e469b83
https://doi.org/10.1117/12.2195735
https://doi.org/10.1117/12.2195735
Autor:
C Wyon, C. Vannuffel, Michael Korwin-Pawlowski, C Vergnaud, R. Laffitte, François Bertin, V. Le Roux, N. Béchu, A. Chabli, S Kerdilès, L. Vallier, Gilles Borsoni
Publikováno v:
Microelectronic Engineering. 59:311-315
Ultra-slow single and multicharged ions (USMCIs) can be used for surface preparation at room temperature, to engineer the top atomic layers of surfaces without modifying the substrate below, in processes such as ultra-thin films growth, etching, depo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1accb9cf11558ffe609bbb08e4182501
https://doi.org/10.1016/s0167-9317(01)00615-3
https://doi.org/10.1016/s0167-9317(01)00615-3
Publikováno v:
Microelectronic Engineering. :239-245
A new approach is proposed for lithography with an objective of high throughput and minimum feature size 50 nm and below — the Ion Reflection Lithography (IRL) using multicharged ions. The concept is based on a recent fundamental discovery of a spe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e074af63cdbfc39befd3f773ba9af45
https://doi.org/10.1016/s0167-9317(01)00484-1
https://doi.org/10.1016/s0167-9317(01)00484-1
Autor:
C Wyon, Mickael Gros-Jean, N. Béchu, V. Le Roux, N. Rochat, Michael Korwin-Pawlowski, R. Laffitte, L. Vallier, Gilles Borsoni
Publikováno v:
Microelectronics Reliability. 41:1063-1066
We have used ultra-slow multicharged ions in ultra-high vacuum with a low partial pressure of O2 to grow ultra-thin layers (0.3 to 2.0 nm) of SiO2 on silicon. The advantage of using ultra-slow ions is that they interact with the surface only through
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9827aaf7689fb32013ead61084b38d89
https://doi.org/10.1016/s0026-2714(01)00076-2
https://doi.org/10.1016/s0026-2714(01)00076-2