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Autor:
Roy Koret, Gilad Belkin, Manasa Medikonda, Shay Wolfling, Curtis Durfee, Frougier Julien, Andrew M. Greene, Roy Shtainman, Daniel Schmidt, Igor Turovets, Dror Shafir, Aron Cepler, Shanti Pancharatnam
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
In this work, the novel enhancement to multichannel scatterometry data collection, Spectral Interferometry, is introduced and discussed. The Spectral Interferometry technology adds unique spectroscopic data by providing absolute phase information. Th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e27002f53f90e40c11a555e03b1c492
https://doi.org/10.1117/12.2582364
https://doi.org/10.1117/12.2582364
