Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Gil Geva-mittelberg"'
Publikováno v:
Microelectronic Engineering. 83:1245-1248
Fabricating precise freestanding metal membranes tens of nanometers thick in a continuous stack with a constant air gap of several microns is a key challenge in a free-electron extreme ultraviolet (EUV) source design program. Such a stack, when expos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b9afdecc12138fa82180f625c5183df
https://doi.org/10.1016/j.mee.2006.01.051
https://doi.org/10.1016/j.mee.2006.01.051
