Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Gian Luca Cassol"'
Publikováno v:
SPIE Proceedings.
Media Lario Technologies (MLT) uses its proprietary replication by electroforming technology to manufacture grazing incidence collectors in support of the EUVL technology roadmap. With the experience of more than 20 alpha and preproduction collectors
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f3bf61c7828aa8c6d956211126ce14a0
https://doi.org/10.1117/12.916157
https://doi.org/10.1117/12.916157
Publikováno v:
SPIE Proceedings.
Media Lario Technologies (MLT) has enabled the Extreme Ultraviolet Lithography (EUVL) roadmap with its grazing incidence collectors installed in all DPP sources since 2006. Furthermore, with several 100 WIF capable production grazing incidence collec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a465b164ae9c060be4667ee264ef1ca
https://doi.org/10.1117/12.879396
https://doi.org/10.1117/12.879396
Autor:
Massimiliano Rossi, Giovanni Bianucci, Fabio Zocchi, A. Bragheri, Gian Luca Cassol, B. Johnson
Publikováno v:
SPIE Proceedings.
Media Lario Technologies (MLT), leveraging off its unique in-field collector experience, has designed the Grazing Incidence Collector (GIC) for the Sn-fueled Discharge Produced Plasma (DPP) source developed by Philips Extreme UV (PEUV) and XTREME tec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::214227152ed4e45e5ebc641222bd3511
https://doi.org/10.1117/12.846712
https://doi.org/10.1117/12.846712
Autor:
M. Prea, Giovanni Bianucci, Max C. Schürmann, Fabio Zocchi, G. Salmaso, Giuseppe Valsecchi, Arnaud Mader, Gian Luca Cassol, J. Kools, Denis Bolshukhin, Peter Zink, Guido Schriever
Publikováno v:
Alternative Lithographic Technologies.
The power roadmap for EUVL high volume manufacturing (HVM) exceeds the 200W EUV in-band power at intermediate focus, thus posing more demanding requirements on HVM sources, debris suppression systems and collectors. Starting from the lessons learned
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0007f316e0cd330eef8f9968c067ad0
https://doi.org/10.1117/12.813652
https://doi.org/10.1117/12.813652
Autor:
Arnaud Mader, Adam Brunton, Klaus Bergmann, Giorgio Pirovano, Giovanni Bianucci, Hans Scheuermann, Peter Zink, Gian Luca Cassol, Fabio Zocchi, Oliver Franken
Publikováno v:
SPIE Proceedings.
The paper presents the results of an investigation into the thermal and optical characteristics of alpha-type dual-mirror grazing incidence collectors for Extreme Ultra-violet Lithography integrated into a tin-fueled discharge produced plasma source.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da88e809a3ee66a75d6db7ec894ee910
https://doi.org/10.1117/12.772977
https://doi.org/10.1117/12.772977
Autor:
Giovanni Bianucci, Max C. Schürmann, Fabio Zocchi, Fabio Marioni, Pietro Binda, Denis Bolshukhin, L. Porreca, Giorgio Pirovano, Imtiaz Ahmad, Gian Luca Cassol
Publikováno v:
SPIE Proceedings.
A dual-mirror grazing incidence collector produced by Media Lario Technologies was integrated into a high-power, Xefueled gas discharge produced plasma (GDPP) source test stand at XTREME technologies, and tested at power levels responding to the prod
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::57d17a8ae18dcba621b8c1c525786ae3
https://doi.org/10.1117/12.712241
https://doi.org/10.1117/12.712241
Autor:
Hans-Jürgen Brück, Gian Luca Cassol, Giovanni Bianucci, Stefan Dobereiner, Günther Falk, Gerd Scheuring, Shiaki Murai
Publikováno v:
22nd European Mask and Lithography Conference.
A 10-year old MueTec2010, white light CD measurement system, installed at DNP Photomask Europe and previously owned by STMicroelectronics, has been upgraded to fulfill the high-end optical CD measurement requirements, and to add the film thickness me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::265e6d0706503ff52f2ef983da520e0e
https://doi.org/10.1117/12.692737
https://doi.org/10.1117/12.692737
Autor:
Carlo Pogliani, Giovanni Bianucci, Gian Luca Cassol, Luigi Raffaele, Shoichi Murata, Ryugo Hikichi, Shiaki Murai, Hidenao Katsuki, Shigeru Noguchi
Publikováno v:
SPIE Proceedings.
The advanced Jeol JBX9000MVII 50kV electron-beam lithography system has been successfully installed at DNP Photomask Europe and timely qualified for the 90nm technology node. The overall performances of this writing tool have thoroughly been assessed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8733728abc430f703ef82c01c7c0dc31
https://doi.org/10.1117/12.632399
https://doi.org/10.1117/12.632399