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pro vyhledávání: '"Gerhard Schluter"'
Autor:
Klaus-Dieter Roth, Walter Steinberg, Jochen Bender, Gerhard Schluter, Michael Ferber, Frank Hillmann, Gerd Scheuring
Publikováno v:
SPIE Proceedings.
For 65nm photo mask lithography, metrology becomes significantly more important. Especially the requirements of the photo mask users versus critical dimension (CD) control, CD homogeneity and CD mean to target, give strong head-aches to lithography a
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19:2861
This article addresses the state-of-the-art in optical mask CD metrology based on the most recent deep ultraviolet (DUV) microscope optics operating at 248 nm. It further points out the future potential and limitations of optical CD metrology in gene