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pro vyhledávání: '"Gerald Galan"'
Autor:
Gilles L. Fanget, Michel Tissier, Yves Quere, Gerald Galan, Jean-Charles Richoilley, Alexandra Barberet
Publikováno v:
SPIE Proceedings.
To print subwavelength dimension features in optical lithography, one must correct significant Optical Proximity Effects as well as some other process outcomes. Nowadays, different firms propose to Silicon Industry Optical Proximity Correction (OPC)
Autor:
Karl Sommer, Yair Eran, Thomas Schaetz, Volodymyr Ordynskyy, Thomas Engel, Emanuele Baracchi, Gerald Galan, Corinne Miramond, Martin Verbeek, Roman Liebe, Hans Hartmann, Kai Peter, Hans-Juergen Brueck, Gerd Scheuring
Publikováno v:
SPIE Proceedings.
The reduction of wavelength in optical lithography and the use of enhancement techniques like phase shift technology, optical proximity correction (OPC), or off-axis illumination, lead to new specifications for advanced photomasks: a challenge for co
Publikováno v:
Proceedings of the 2001 International Symposium: Physical Design; 4/ 1/2001, p38-43, 6p