Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Gerald G Lopez"'
Autor:
Tzu-Yung Huang, Richard R. Grote, Sander A. Mann, David A. Hopper, Annemarie L. Exarhos, Gerald G. Lopez, Garrett R. Kaighn, Erik C. Garnett, Lee C. Bassett
Publikováno v:
Nature Communications, Vol 10, Iss 1, Pp 1-8 (2019)
Photon collection from quantum emitters is difficult, and their scale requires the use of free-space optical measurement setups which prevent packaging of quantum devices. Here, the authors design and fabricate a metasurface that acts as an immersion
Externí odkaz:
https://doaj.org/article/56a7a96b616f49b7a20192d63c79abff
Autor:
Chen Lin, Samuel M. Nicaise, Drew E. Lilley, Joan Cortes, Pengcheng Jiao, Jaspreet Singh, Mohsen Azadi, Gerald G. Lopez, Meredith Metzler, Prashant K. Purohit, Igor Bargatin
Publikováno v:
Nature Communications, Vol 9, Iss 1, Pp 1-8 (2018)
Sandwich structures such as corrugated cardboard offer low weight and high bending stiffness, but they are difficult to produce at the nanoscale. Here, the authors combine webbing and perforation to produce alumina ‘nanocardboard’ with ultralow a
Externí odkaz:
https://doaj.org/article/ec65a9230c7b482b9b152eafa60efecb
Autor:
Erik C. Garnett, Sander A. Mann, Richard R. Grote, Lee C. Bassett, David A. Hopper, Gerald G Lopez, Annemarie L. Exarhos, Tzu-Yung Huang, Garrett R. Kaighn
Publikováno v:
Nature Communications, Vol 10, Iss 1, Pp 1-8 (2019)
Nature Communications
Nature Communications
Quantum emitters such as the diamond nitrogen-vacancy (NV) center are the basis for a wide range of quantum technologies. However, refraction and reflections at material interfaces impede photon collection, and the emitters’ atomic scale necessitat
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
Electronic beam lithography (EBL) is commonly used for patterning at the nanoscale by way of a focused electron beam. This process can lead to charge accumulation on the surface of the resist when used in conjunction with non-conductive substrate mat
Autor:
Erik C. Garnett, Annemarie L. Exarhos, Richard R. Grote, Sander A. Mann, Lee C. Bassett, David A. Hopper, Tzu-Yung Huang, Gerald G Lopez
Publikováno v:
Frontiers in Optics 2017.
We demonstrate a high-transmission efficiency, high-numerical-aperture metalens etched into the surface of single-crystal diamond for coupling to quantum emitters. Metalens performance is matched to full-field simulations, and photoluminescence from
Autor:
Christopher H. Ray, Ian Gilbert, Kartik Srinivasan, David A. Czaplewski, Brian A. Bryce, Krishna C. Balram, Christopher B. Wallin, Meredith Metzler, Slava Krylov, Karen E. Grutter, Leonidas E. Ocola, Vladimir A. Aksyuk, Juraj Topolancik, Thomas Michels, Richard Kasica, Neal A. Bertrand, J. Alexander Liddle, Nicolae Lobontiu, Liya Yu, Marcelo Davanco, Gregory Simelgor, Yuxiang Liu, Gerald G. Lopez, Daron A. Westly, Samuel M. Stavis, Vojtech Svatos, Kristen A. Dill, B. Robert Ilic, Qing Li, Pavel Neuzil
Publikováno v:
J Res Natl Inst Stand Technol
Balram, K C, Westly, D A, Davanço, M, Grutter, K E, Li, Q, Michels, T, Ray, C H, Yu, L, Kasica, R J, Wallin, C B, Gilbert, I J, Bryce, B A, Simelgor, G, Topolancik, J, Lobontiu, N, Liu, Y, Neuzil, P, Svatos, V, Dill, K A, Bertrand, N A, Metzler, M G, Lopez, G, Czaplewski, D A, Ocola, L, Srinivasan, K A, Stavis, S M, Aksyuk, V A, Alexander Liddle, J, Krylov, S & Robert Ilic, B 2016, ' The Nanolithography Toolbox ', Journal of Research of the National Institute of Standards and Technology, vol. 121, pp. 464-475 . https://doi.org/10.6028/jres.121.024
Balram, K C, Westly, D A, Davanço, M, Grutter, K E, Li, Q, Michels, T, Ray, C H, Yu, L, Kasica, R J, Wallin, C B, Gilbert, I J, Bryce, B A, Simelgor, G, Topolancik, J, Lobontiu, N, Liu, Y, Neuzil, P, Svatos, V, Dill, K A, Bertrand, N A, Metzler, M G, Lopez, G, Czaplewski, D A, Ocola, L, Srinivasan, K A, Stavis, S M, Aksyuk, V A, Alexander Liddle, J, Krylov, S & Robert Ilic, B 2016, ' The Nanolithography Toolbox ', Journal of Research of the National Institute of Standards and Technology, vol. 121, pp. 464-475 . https://doi.org/10.6028/jres.121.024
This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Stan
Autor:
Meredith Metzler, Nikola Belic, Gerald G Lopez, Kevin Lister, Michael LaBella, Ulrich Hofmann, Mohsen Azadi, Chad Eichfeld, Glen de Villafranca
Publikováno v:
Journal of Vacuum Science & Technology B. 36:06JA05
This work examines the isofocality of four commercially available positive resists for electron beam lithography (EBL) at 100 keV: AR-P 6200 (commercially known as CSAR 62) by AllResist GmbH, ZEP520A by Zeon Corp., polymethylmethacrylate 950 A4 (950k
Publikováno v:
International Journal on Artificial Intelligence Tools. :247-263
We propose a method that aids in the evaluation of residual strain in blood vessels. Strain measurement is important in stress analysis of cardiovascular tissues. Since its introduction in 1983, arterial residual strain is evaluated manually which is
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 34:06K601
Shape positional accuracy is a ubiquitous challenge when writing critical features using electron beam (e-beam) lithography. Positional accuracy can be particularly important when patterning for dense pattern arrays often found in plasmonic device st
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 33:06FD02
Nanoscale geometry assisted proximity effect correction (NanoPEC) is demonstrated to improve PEC for nanoscale structures over standard PEC, in terms of feature sharpness for sub-100 nm structures. The method was implemented onto an existing commerci