Zobrazeno 1 - 10
of 94
pro vyhledávání: '"George Kokkoris"'
Publikováno v:
Micromachines, Vol 14, Iss 1, p 172 (2023)
Polymerase chain reaction (PCR) is the most common method used for nucleic acid (DNA) amplification. The development of PCR-performing microfluidic reactors (μPCRs) has been of major importance, due to their crucial role in pathogen detection applic
Externí odkaz:
https://doaj.org/article/29212c401a48433b8f156b35bb85ffbf
Publikováno v:
Frontiers in Physics, Vol 9 (2021)
Monte Carlo (MC) and kinetic Monte Carlo (kMC) models are widely used for studying the physicochemical surface phenomena encountered in most deposition processes. This spans from physical and chemical vapor deposition to atomic layer and electrochemi
Externí odkaz:
https://doaj.org/article/163156b73ea14c9ba90f5b09f4cf8cb2
Autor:
Georgia D. Kaprou, Vasileios Papadopoulos, Christos-Moritz Loukas, George Kokkoris, Angeliki Tserepi
Publikováno v:
Micromachines, Vol 11, Iss 3, p 258 (2020)
In recent years, printed circuit board (PCB)-based microfluidics have been explored as a means to achieve standardization, seamless integration, and large-scale manufacturing of microfluidics, thus paving the way for widespread commercialization of d
Externí odkaz:
https://doaj.org/article/f1a26c9a90c14240a724701fb1e8150b
Publikováno v:
Micromachines, Vol 9, Iss 8, p 415 (2018)
The interaction of plasma with polymeric substrates generates both roughness and charging on the surface of the substrates. This work, toward the comprehension and, finally, the control of plasma-induced surface roughness, delves into the intertwined
Externí odkaz:
https://doaj.org/article/fdee5b69ff00480ea8652d05aca8a000
Autor:
George Memos, George Kokkoris, Vassilios Constantoudis, Cheuk Wing Edmond Lam, Abinash Tripathy, Efstratios Mitridis, Athanasios Milionis, Dimos Poulikakos, Evangelos Gogolides
Publikováno v:
International Journal of Heat and Mass Transfer, 197
International Journal of Heat and Mass Transfer
International Journal of Heat and Mass Transfer
Dropwise condensation (DWC) is a phenomenon of common occurrence and significant utility in nature and technology. In energy applications, sustenance of DWC and avoidance of transition to film formation is directly related to efficient heat removal,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1c62f4e85291c130967dcc8ebdd36c77
https://hdl.handle.net/20.500.11850/564663
https://hdl.handle.net/20.500.11850/564663
Autor:
Luca Stendardo, Athanasios Milionis, George Kokkoris, Christos Stamatopoulos, Chander Shekhar Sharma, Raushan Kumar, Matteo Donati, Dimos Poulikakos
Publikováno v:
Langmuir, 39 (4)
Rapid and sustained condensate droplet departure from a surface is key toward achieving high heat-transfer rates in condensation, a physical process critical to a broad range of industrial and societal applications. Despite the progress in enhancing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5235bd229dbbc81643ed582fac87ec36
http://arxiv.org/abs/2211.02876
http://arxiv.org/abs/2211.02876
Autor:
Varvara Andreou, Marianna Giannoglou, Maria-Zacharoula Xanthou, Dimitrios Passaras, George Kokkoris, Εvangelos Gogolides, George Katsaros
Publikováno v:
Innovative Food Science & Emerging Technologies. 86:103361
Autor:
Sofia Chanioti, Marianna Giannoglou, Panagiota Stergiou, Dimitrios Passaras, Panagiotis Dimitrakellis, George Kokkoris, Evangelos Gogolides, George Katsaros
Publikováno v:
Innovative Food Science & Emerging Technologies. 85:103334
Autor:
Sofia Chanioti, Marianna Giannoglou, Panagiota Stergiou, Dimitris Passaras, Panagiotis Dimitrakellis, George Kokkoris, Evangelos Gogolides, George Katsaros
Publikováno v:
Food Research International. 167:112639
Publikováno v:
Archives of Computational Methods in Engineering. 28:637-672
Chemical vapor deposition (CVD) is an established process for the production of thin solid films for industrial and scientific applications for more than 30 years. CVD is a multiscale process; the process per se takes place in a reactor of the order