A New Breed of Wet-Developable BARC Materials

Autor: Kevin O'Shea, Yoshihiro Yamamoto, Jin Wuk Sung, Libor Vyklicky, Pushkara Rao Varanasi, George G. Barclay, Irene Popova, James F. Cameron, Jason A. DeSISTO, Manabu Hidano, Johan Amara, David Valeri, Vaishali R. Vohra, Greg Prokopowicz, Adam Ware, Tomoki Kurihara, Kathleen M. O'Connell, Wu-Song Huang

Publikováno v: Journal of Photopolymer Science and Technology. 22:17-24

A new family of materials has been developed to serve as a wet-developable bottom antireflective coating (D-BARC) for patterning levels that have a strong need to avoid dry-etch processes for BARC-open steps. Such include some implant levels, where d

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::82c1c025ab30f31631633756506e17c2
https://doi.org/10.2494/photopolymer.22.17

Resists for next generation lithography

Autor: Leonidas E. Ocola, Robert L. Brainard, George G. Barclay, Erik H. Anderson

Publikováno v: Brainard, Robert L.; Barclay, George G.; Anderson, Erik H.; & Ocola, Leonidas E.(2001). Resists for next generation lithography. Lawrence Berkeley National Laboratory. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/0v6799mg

Four next generation lithographic options (EUV, X-ray, EPL, IPL) are compared against four current optical technologies (i-line, DUV, 193 nm, 157 nm) for resolution capabilities based on wavelength. Studies are also made comparing absorption characte

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::125651e4f2335ae51779665bc99174ec
https://doi.org/10.1016/s0167-9317(02)00564-6

Diffusion and Distribution Studies of Photoacid Generators. Ion Beam Analysis in Lithograpy

Autor: George G. Barclay, Narayan Sundararajan, Juliann Opitz, Guangyu Xu, Robert D. Allen, Christopher F. Keimel, Christopher K. Ober, Navin Bhargava

Publikováno v: Journal of Photopolymer Science and Technology. 12:457-467

As the resolution of photoresists is being pushed to its limits, it becomes critical to understand the fundamental mechanisms and interactions among the various components in a photoresist. Chemically amplified photoresist systems have added componen

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::bbdf14475692f40a97b2c708e0b988f8
https://doi.org/10.2494/photopolymer.12.457

'Living' Free-Radical Polymerizations in the Absence of Initiators: Controlled Autopolymerization

Autor: Lora M. Michalak, Mathew Mate, George G. Barclay, Craig J. Hawker, Bulent Kurdi, Roger Sinta, Eva Malmström, Wayne Devonport

Publikováno v: Macromolecules. 30:1929-1934

The autopolymerization of styrene, styrenic derivatives, and styrene/(meth)acrylate comonomer mixtures in the presence of stable nitroxide free radicals has been shown to be a “living” process. Molecular weight can be controlled by varying the ra

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c282fde71124b3b39a992780430666f1
https://doi.org/10.1021/ma9615866

Initiating Systems for Nitroxide-Mediated 'Living' Free Radical Polymerizations: Synthesis and Evaluation

Autor: Arturo Orellana, Julian Dao, George G. Barclay, Wayne Devonport, Craig J. Hawker

Publikováno v: Macromolecules. 29:5245-5254

A variety of initiating systems for the preparation of macromolecules by nitroxide-mediated “living” free radical procedures have been prepared and evaluated. The systems can be divided into two classes, unimolecular initiators in which alkylated

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::77b0b79bc2e9342a2907feea6c46ffc3
https://doi.org/10.1021/ma951905d