Zobrazeno 1 - 1
of 1
pro vyhledávání: '"George A. Gomba"'
Autor:
R. J. Amodeo, Ben R. Vampatella, George A. Gomba, Alex L. Flamholz, Carl Stahlhammer, D. A. Heald, Azalia A. Krasnoperova, P. C. Kochersperger, Robert H. Fair, J. P. Silverman, William Chu, Alek C. Chen, Vincent Dimilia, Robert P. Rippstein
Publikováno v:
SPIE Proceedings.
A state-of-the-art proximity x-ray lithography aligner was developed for the Defense Advanced Lithography Program (DALP) and installed in IBM's Advanced Lithography Facility (ALF) in 1995. This aligner was designed to satisfy the manufacturing requir
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44a80fdbb710f4c3fe369b04dd149b1b
https://doi.org/10.1117/12.275803
https://doi.org/10.1117/12.275803
