Zobrazeno 1 - 10
of 33
pro vyhledávání: '"Gensong Li"'
Autor:
Xin Deng, Guoli Zhang, Ling Zhang, Yan Feng, Zehong Li, GuangMou Wu, Yuhuan Yue, Gensong Li, Yu Cao, Ping Zhu
Publikováno v:
PLoS ONE, Vol 10, Iss 11, p e0142558 (2015)
Non-viral gene delivery system with many advantages has a great potential for the future of gene therapy. One inherent obstacle of such approach is the uptake by endocytosis into vesicular compartments. Receptor-mediated gene delivery method holds pr
Externí odkaz:
https://doaj.org/article/36ba63a20adf4152b41c8029d8a5d0e4
Publikováno v:
IEICE Transactions on Information and Systems. :1495-1500
Publikováno v:
IEEE Transactions on Nuclear Science. 68:1565-1570
Layout dependence of total-ionizing-dose (TID) response, hot-carrier degradation (HCD), and radiation-enhanced HCD (REHCD) in 65-nm bulk Si nMOSFETs are experimentally investigated in this article. For TID response, the average irradiation-induced $V
Publikováno v:
IEEE Transactions on Electron Devices. 68:2142-2146
The impact of heavy ion irradiation on the variability of 65 nm bulk Si MOSFETs is experimentally demonstrated in this brief. Due to the intrinsic random incidence of heavy ions, additional variability is introduced in the irradiated devices through
Publikováno v:
Science China Information Sciences. 65
Publikováno v:
IEEE Transactions on Nuclear Science. 67:1320-1325
The total ionizing dose (TID) response of bulk Si PMOS FinFETs with two fin widths and two types of fin orientation (standard and 45° rotated) is experimentally investigated under four irradiation bias conditions. The bias dependence of bulk Si PMOS
Publikováno v:
IEEE Transactions on Nuclear Science. 66:1592-1598
The interface quality between the gate dielectric and germanium (Ge) channel plays a crucial role for Ge MOSFETs. The impact of different interface passivation techniques on the total ionizing dose (TID) effect of Ge pMOSFET with enclosed-layout and
Publikováno v:
2021 China Semiconductor Technology International Conference (CSTIC).
In this paper, the impact of gate length on Single Event Upset (SEU) characteristics of 14 nm bulk and SOI FinFET 6T SRAM is investigated and compared by mixed-mode 3D TCAD simulation. Simulation results show that for both bulk and SOI FinFET SRAM ce
Publikováno v:
Science China Information Sciences. 64
Autor:
Gensong Li, Chen Feng, Lingling Liu, Dahai Yu, Sen Li, Chunyu Li, Hanwen Li, Yu Cao, Xin Deng
Publikováno v:
Cell Biochemistry and Function. 36:221-227
Defects in meiotic maturation may lead to chromosome segregation errors and genomic instability. Previous reports indicated that protein kinase C delta (PKCδ) may interact with microtubule organizing center-associated protein to play a role on meiot