Zobrazeno 1 - 10
of 37
pro vyhledávání: '"Genshiro Kawachi"'
Autor:
Genshiro Kawachi
Publikováno v:
SID Symposium Digest of Technical Papers. 51:1390-1393
Autor:
Yukio Taniguchi, Shigeyuki Shimoto, Takahiko Endo, Takashi Okada, Tomoya Katou, Genshiro Kawachi, Kazufumi Azuma, Shinzo Tsuboi, Takashi Ohno, Masahiro Mitani, Masakiyo Matsumura
Publikováno v:
Japanese Journal of Applied Physics. 47:8707-8713
Thin-film transistors (TFTs) were fabricated on polycrystalline silicon (poly-Si) films formed by position-controlled large-grain growth technology using an excimer laser. The field-effect mobility, on-off transition slope, and threshold voltage were
Publikováno v:
SID Symposium Digest of Technical Papers. 38:276-279
High-frequency characteristics of sub-micron Si TFTs fabricated on large-grain poly-Si films are demonstrated for the first time. A cutoff frequency (fT) of 6 GHz and a maximum oscillation frequency (f max) of 25 GHz were obtained for the TFT with a
Publikováno v:
Japanese Journal of Applied Physics. 46:1312-1317
The dependences of field-effect mobility, threshold voltage, and subthreshold slope on temperature for low-temperature polycrystalline silicon (LTPS) thin film transistors (TFTs) with large grains were investigated. It was shown that the temperature
Autor:
Hiroyuki Ogawa, Terunori Warabisako, Masayuki Jyumonji, Genshiro Kawachi, Kazufumi Azuma, Noritaka Akita, Yoshiaki Nakazaki, Masato Hiramatu, Masakiyo Matsumura
Publikováno v:
Japanese Journal of Applied Physics. 46:51-55
Polycrystalline silicon (poly-Si) complementary metal–oxide–semiconductor (CMOS) circuits have been fabricated by using an advanced excimer-laser annealing method and a plasma-oxidation method. The 1-µm-long thin-film transistors (TFTs) were fab
Publikováno v:
The Journal of The Institute of Image Information and Television Engineers. 61:1320-1325
The effects of the source and drain junction depth on breakdown voltage of high-performance Si TFTs have been studied.It is found that decreasing the junction depth results in a substantial increase in the sourcedrain breakdown voltage (VBD).The impr
Autor:
Genshiro Kawachi
Publikováno v:
ECS Transactions. 3:45-55
Design considerations for making use of ultra-high performance Si TFTs for future display systems are presented. Careful choice of the thickness and impurity concentration of the TFT channel is important to maximize the breakdown voltage. In the sub-
Autor:
Masato Hiramatu, Terunori Warabisako, Hiroyuki Ogawa, Masakiyo Matsumura, Genshiro Kawachi, Kazufumi Azuma, Masayuki Jyumonji, Yoshiaki Nakazaki
Publikováno v:
Japanese Journal of Applied Physics. 45:1489-1494
Excellent characteristics of polycrystalline silicon (poly-Si) thin-film transistors (TFTs) with long and narrow grains aligned one-dimension have been experimentally clarified for the first time. The field effect mobility and on-off transition slope
Publikováno v:
Scopus-Elsevier
Carrier transport processes in hydrogenated amorphous silicon-based thin-film transistors (a-Si:H TFT's) are investigated by spin-dependent transport (SDT). Spin-dependent photoconductivity (SDPC) signals arising from less than ${10}^{6}$ spins in a
Autor:
Kimura Etsuko, Yuka Matsukawa, Hiroki Yamamoto, Nobutake Konishi, Genshiro Kawachi, Y. Wakui, Akira Sasano
Publikováno v:
IEEE Transactions on Electron Devices. 41:1120-1124
A novel process technology for a-Si TFT-LCD's with the buried ITO electrode (BI) structure was developed and applied to 10-in-diagonal LCD panels. By employing the BI structure, an aperture ratio of 29% was achieved in high resolution panels with a p