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pro vyhledávání: '"GekSoon Chua"'
Publikováno v:
Photomask Technology 2018.
EUV lithography draws increasing attention and its expectation is rising. For instance, replacing a triple patterning with ArF immersion lithography to EUV single patterning may reduce 50% of cost and 25% of cycle time [1]. At the same time, the impo
Publikováno v:
SPIE Newsroom.
Autor:
Omar El-Sewefy, Pat LaCour, GekSoon Chua, Dongqing Zhang, Vlad Liubich, Aasutosh Dave, Alvin Chua, Ying Gong, YeeMei Foong, Alex Tritchkov, Jacky Cheng, Robin Chia
Publikováno v:
SPIE Proceedings.
Source Mask Optimization (SMO) has become an integral part of resolution enhancement techniques (RET) for almost all critical layers at advanced technology nodes. Over the past couple of years, various flows have emerged for integrating SMO into main