Zobrazeno 1 - 10
of 102
pro vyhledávání: '"Gehong Zeng"'
Autor:
Ashok T. Ramu, Gehong Zeng, Joshua M. O. Zide, Ali Shakouri, Je-Hyeong Bahk, Zhixi Bian, Peter Burke, Arthur C. Gossard, John E. Bowers, Di Liang, Hong Lu, Rajeev Singh
Publikováno v:
Bahk, Je-Hyeong; Zeng, Gehong; Zide, Joshua M.; Lu, Hong; Singh, Rajeev; Liang, Di; et al.(2010). High-Temperature Thermoelectric Characterization of III–V Semiconductor Thin Films by Oxide Bonding. Journal of Electronic Materials, 39(8), pp 1125-1132. doi: 10.1007/s11664-010-1258-5. Retrieved from: http://www.escholarship.org/uc/item/58k423jd
A device fabrication and measurement method utilizing a SiO2–SiO2 covalent bonding technique is presented for high-temperature thermoelectric characterization of thin-film III–V semiconductor materials that suffer from the side-effect of substrat
Publikováno v:
IEEE Transactions on Components and Packaging Technologies. 31:552-558
In this paper, we describe how to use Si/SiGe superlattice microcoolers to cool the target hot spots and how a trench structure could enhance its cooling performance. The microcooler chip is gold fusion bonded with a 65 mum-thick silicon chip, where
Publikováno v:
Microelectronics Journal. 39:981-991
Most of the conventional thermal management techniques can be used to cool the whole chip. Since thermal design requirements are mostly driven by the peak temperatures, reducing or eliminating hot spots could alleviate the design requirements for the
Autor:
Gehong Zeng, Suzanne L. Singer, Hong Lu, Arthur C. Gossard, Joshua M. O. Zide, Rajeev Singh, Arun Majumdar, Ali Shakouri, John E. Bowers, Woochul Kim, Je-Hyeong Bahk, Zhixi Bian
Publikováno v:
Journal of Electronic Materials. 37:1786-1792
The thermoelectric properties of ErAs:InGaAlAs were characterized by variable-temperature measurements of thermal conductivity, electrical conductivity, and Seebeck coefficient from 300 K to 600 K, which shows that the ZT(\(=\alpha^{2}\sigma T/\kappa
Publikováno v:
IEEE Transactions on Components and Packaging Technologies. 29:395-401
In this paper, we addressed heating problems in integrated circuits (ICs) and proposed a thin-film thermionic cooling solution using Si/SiGe superlattice microrefrigerators. We compared our technology with the current most common solution, thermoelec
Autor:
Edward T. Croke, Xiaofeng Fan, Yan Zhang, Chris LaBounty, Gehong Zeng, Ali Shakouri, Daryoosh Vashaee, James Christofferson, John E. Bowers, Joachim Piprek
Publikováno v:
Microscale Thermophysical Engineering. 9:99-118
Modeling and optimization of bulk SiGe thin-film coolers are described. Thin-film coolers can provide large cooling power densities compared to commercial thermoelectrics. Thin-film SiGe coolers have been demonstrated with maximum cooling of 4°C at
Publikováno v:
Zhang, Y; Shakouri, A; & Zeng, G H. (2004). High-power-density spot cooling using bulk thermoelectrics. Applied Physics Letters, 85(14), 2977-2979. UC Santa Cruz: Retrieved from: http://www.escholarship.org/uc/item/0j2975j6
We demonstrate a three-dimensional (3D) bulk silicon microcooler, which has the advantages of high cooling power densities and is less dependent on thermoelectric element's thickness as compared with the same device with one-dimensional (1D) geometry
Autor:
Ali Shakouri, Edward T. Croke, Gehong Zeng, Alexis R. Abramson, Xiaofeng Fan, Arun Majumdar, Scott T. Huxtable, Chris LaBounty, Chang Lin Tien, John E. Bowers
Publikováno v:
Applied Physics Letters. 80:1737-1739
The cross-plane thermal conductivity of four Si/Si0.7Ge0.3 superlattices and three Si0.84Ge0.16/Si0.76Ge0.24 superlattices, with periods ranging from 45 to 300 and from 100 to 200 A, respectively, were measured over a temperature range of 50 to 320 K
Autor:
Peter Burke, Ashok T. Ramu, Hong Lu, Je-Hyeong Bahk, Gehong Zeng, John E. Bowers, Arthur C. Gossard
Publikováno v:
Advanced materials (Deerfield Beach, Fla.). 23(20)
In this work, we present research on semimetal-semiconductor nanocomposites grown by molecular beam epitaxy (MBE) for thermoelectric applications. We study several different III-V semiconductors embedded with semimetallic rare earth-group V (RE-V) co
Autor:
Peter Burke, Je-Hyeong Bahk, Arthur C. Gossard, Gehong Zeng, Ashok T. Ramu, Hong Lu, John E. Bowers
Publikováno v:
ChemInform. 42
In this work, we present research on semimetal-semiconductor nanocomposites grown by molecular beam epitaxy (MBE) for thermoelectric applications. We study several different III-V semiconductors embedded with semimetallic rare earth-group V (RE-V) co