Zobrazeno 1 - 10
of 552
pro vyhledávání: '"Gehlhaar, R."'
Autor:
Goldberg I; IMEC, Kapeldreef 75, Leuven, 3001, Belgium.; ESAT, KU Leuven, Kasteelpark Arenberg, Leuven, 3001, Belgium., Elkhouly K; IMEC, Kapeldreef 75, Leuven, 3001, Belgium.; ESAT, KU Leuven, Kasteelpark Arenberg, Leuven, 3001, Belgium., Annavarapu N; IMEC, Kapeldreef 75, Leuven, 3001, Belgium.; ESAT, KU Leuven, Kasteelpark Arenberg, Leuven, 3001, Belgium., Hamdad S; IMEC, Kapeldreef 75, Leuven, 3001, Belgium.; ESAT, KU Leuven, Kasteelpark Arenberg, Leuven, 3001, Belgium., Gonzalez MC; IMEC, Kapeldreef 75, Leuven, 3001, Belgium.; ESAT, KU Leuven, Kasteelpark Arenberg, Leuven, 3001, Belgium., Genoe J; IMEC, Kapeldreef 75, Leuven, 3001, Belgium.; ESAT, KU Leuven, Kasteelpark Arenberg, Leuven, 3001, Belgium., Gehlhaar R; IMEC, Kapeldreef 75, Leuven, 3001, Belgium., Heremans P; IMEC, Kapeldreef 75, Leuven, 3001, Belgium.; ESAT, KU Leuven, Kasteelpark Arenberg, Leuven, 3001, Belgium.
Publikováno v:
Advanced materials (Deerfield Beach, Fla.) [Adv Mater] 2024 Oct; Vol. 36 (40), pp. e2314193. Date of Electronic Publication: 2024 Aug 23.
Autor:
Papadopoulou A; imec, Kapeldreef 75, Leuven 3001, Belgium.; Department of Electrical Engineering (ESAT), KU Leuven, Kasteelpark Arenberg 10, Leuven 3001, Belgium., Saha RA; cMAS, Department of Microbial and Molecular Systems, KU Leuven, Celestijnenlaan 200F, Leuven 3001, Belgium., Pintor-Monroy MI; imec, Kapeldreef 75, Leuven 3001, Belgium., Song W; imec, Kapeldreef 75, Leuven 3001, Belgium., Lieberman I; imec, Kapeldreef 75, Leuven 3001, Belgium., Solano E; NCD-SWEET Beamline, ALBA Synchrotron Light Source, Cerdanyola del Vallès, Barcelona 08290, Spain., Roeffaers MBJ; cMAS, Department of Microbial and Molecular Systems, KU Leuven, Celestijnenlaan 200F, Leuven 3001, Belgium., Gehlhaar R; imec, Kapeldreef 75, Leuven 3001, Belgium., Genoe J; imec, Kapeldreef 75, Leuven 3001, Belgium.; Department of Electrical Engineering (ESAT), KU Leuven, Kasteelpark Arenberg 10, Leuven 3001, Belgium.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2024 Sep 11; Vol. 16 (36), pp. 47889-47901. Date of Electronic Publication: 2024 Aug 27.
Autor:
Gegevičius R; Department of Molecular Compound Physics, Center for Physical Sciences and Technology, Saulėtekio Avenue 3, LT-10257 Vilnius, Lithuania., Elkhouly K; Department of Electrical Engineering, KU Leuven, Kasteelpark, Arenberg, 3001 Leuven, Belgium.; IMEC, Kapeldreef 75, 3001 Leuven, Belgium., Franckevičius M; Department of Molecular Compound Physics, Center for Physical Sciences and Technology, Saulėtekio Avenue 3, LT-10257 Vilnius, Lithuania., Chmeliov J; Department of Molecular Compound Physics, Center for Physical Sciences and Technology, Saulėtekio Avenue 3, LT-10257 Vilnius, Lithuania.; Institute of Chemical Physics, Faculty of Physics, Vilnius University, Saulėtekio Avenue 9, LT-10222 Vilnius, Lithuania., Goldberg I; Department of Electrical Engineering, KU Leuven, Kasteelpark, Arenberg, 3001 Leuven, Belgium.; IMEC, Kapeldreef 75, 3001 Leuven, Belgium., Gehlhaar R; IMEC, Kapeldreef 75, 3001 Leuven, Belgium., Qiu W; IMEC, Kapeldreef 75, 3001 Leuven, Belgium., Genoe J; Department of Electrical Engineering, KU Leuven, Kasteelpark, Arenberg, 3001 Leuven, Belgium.; IMEC, Kapeldreef 75, 3001 Leuven, Belgium., Heremans P; Department of Electrical Engineering, KU Leuven, Kasteelpark, Arenberg, 3001 Leuven, Belgium.; IMEC, Kapeldreef 75, 3001 Leuven, Belgium., Gulbinas V; Department of Molecular Compound Physics, Center for Physical Sciences and Technology, Saulėtekio Avenue 3, LT-10257 Vilnius, Lithuania.; Institute of Chemical Physics, Faculty of Physics, Vilnius University, Saulėtekio Avenue 9, LT-10222 Vilnius, Lithuania.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2023 Sep 13; Vol. 15 (36), pp. 42784-42791. Date of Electronic Publication: 2023 Aug 30.
Publikováno v:
In Organic Electronics January 2013 14(1):430-435
Publikováno v:
Applied optics [Appl Opt] 2023 Jun 10; Vol. 62 (17), pp. F14-F20.
Autor:
Malinowski PE, Pejović V, Lieberman I, Kim JH, Siddik AB, Georgitzikis E, Lim MJ, Moreno Hagelsieb L, Hermans Y, Pintor Monroy I, Song W, Basak S, Gehlhaar R, De Roose F, Siskos A, Papadopoulos N, Thijs S, Vershooten T, Chandrasekaran N, Li Y, Soussan P, Genoe J, Heremans P, Lee J, Cheyns D
Publikováno v:
Applied optics [Appl Opt] 2023 Jun 10; Vol. 62 (17), pp. F21-F30.
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Akademický článek
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Akademický článek
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Autor:
Steele JA; cMACS, Department of Microbial and Molecular Systems, KU Leuven, 3001, Leuven, Belgium. julian.steele@kuleuven.be.; Department of Chemistry, University of California, Berkeley, CA, 94720, USA. julian.steele@kuleuven.be.; School of Mathematics and Physics, The University of Queensland, Brisbane, QLD, 4072, Australia. julian.steele@kuleuven.be., Braeckevelt T; Center for Molecular Modeling (CMM), Ghent University, Technologiepark 46, 9052, Zwijnaarde, Belgium.; Department of Chemistry, KU Leuven, Celestijnenlaan 200F, Leuven, 3001, Belgium., Prakasam V; cMACS, Department of Microbial and Molecular Systems, KU Leuven, 3001, Leuven, Belgium., Degutis G; cMACS, Department of Microbial and Molecular Systems, KU Leuven, 3001, Leuven, Belgium., Yuan H; Department of Chemistry, KU Leuven, Celestijnenlaan 200F, Leuven, 3001, Belgium.; Department of Electrical and Computer Engineering, University of Toronto, 35 St George Street, Toronto, Ontario, M5S 1A4, Canada., Jin H; Department of Chemistry, KU Leuven, Celestijnenlaan 200F, Leuven, 3001, Belgium., Solano E; NCD-SWEET beamline, ALBA synchrotron light source, 08290, Cerdanyola del Vallès, Barcelona, Spain., Puech P; CEMES/CNRS, Université de Toulouse, 29, rue Jeanne Marvig, 31055, Toulouse, France., Basak S; IMEC, Kapeldreef 75, 3001, Leuven, Belgium.; Department of Electrical Engineering (ESAT), KU Leuven, Kasteelpark Arenberg 10, 3001, Leuven, Belgium., Pintor-Monroy MI; IMEC, Kapeldreef 75, 3001, Leuven, Belgium.; Department of Electrical Engineering (ESAT), KU Leuven, Kasteelpark Arenberg 10, 3001, Leuven, Belgium., Van Gorp H; Department of Chemistry, KU Leuven, Celestijnenlaan 200F, Leuven, 3001, Belgium., Fleury G; cMACS, Department of Microbial and Molecular Systems, KU Leuven, 3001, Leuven, Belgium., Yang RX; The Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California, 94720, USA., Lin Z; Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.; Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA., Huang H; cMACS, Department of Microbial and Molecular Systems, KU Leuven, 3001, Leuven, Belgium., Debroye E; Department of Chemistry, KU Leuven, Celestijnenlaan 200F, Leuven, 3001, Belgium., Chernyshov D; Swiss-Norwegian Beamlines at the European Synchrotron Radiation Facility, 71 Avenue des Martyrs, F-38000, Grenoble, France., Chen B; Department of Electrical and Computer Engineering, University of Toronto, 35 St George Street, Toronto, Ontario, M5S 1A4, Canada., Wei M; Department of Electrical and Computer Engineering, University of Toronto, 35 St George Street, Toronto, Ontario, M5S 1A4, Canada., Hou Y; Department of Electrical and Computer Engineering, University of Toronto, 35 St George Street, Toronto, Ontario, M5S 1A4, Canada., Gehlhaar R; IMEC, Kapeldreef 75, 3001, Leuven, Belgium., Genoe J; IMEC, Kapeldreef 75, 3001, Leuven, Belgium.; Department of Electrical Engineering (ESAT), KU Leuven, Kasteelpark Arenberg 10, 3001, Leuven, Belgium., De Feyter S; Department of Chemistry, KU Leuven, Celestijnenlaan 200F, Leuven, 3001, Belgium., Rogge SMJ; Center for Molecular Modeling (CMM), Ghent University, Technologiepark 46, 9052, Zwijnaarde, Belgium., Walsh A; Department of Materials, Imperial College London, Exhibition Road, London, SW7 2AZ, United Kingdom.; Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Korea., Sargent EH; Department of Electrical and Computer Engineering, University of Toronto, 35 St George Street, Toronto, Ontario, M5S 1A4, Canada., Yang P; Department of Chemistry, University of California, Berkeley, CA, 94720, USA.; Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.; Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA.; Kavli Energy Nano Science Institute, Berkeley, CA, 94720, USA., Hofkens J; Department of Chemistry, KU Leuven, Celestijnenlaan 200F, Leuven, 3001, Belgium.; Max Plank Institute for Polymer Research, Mainz, D-55128, Germany., Van Speybroeck V; Center for Molecular Modeling (CMM), Ghent University, Technologiepark 46, 9052, Zwijnaarde, Belgium. veronique.vanspeybroeck@ugent.be., Roeffaers MBJ; cMACS, Department of Microbial and Molecular Systems, KU Leuven, 3001, Leuven, Belgium. maarten.roeffaers@kuleuven.be.
Publikováno v:
Nature communications [Nat Commun] 2022 Dec 06; Vol. 13 (1), pp. 7513. Date of Electronic Publication: 2022 Dec 06.