Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Geert Vanderberghe"'
Autor:
Alexander Tritchkov, Geert Vanderberghe, Neal Lafferty, Yuansheng Ma, Joost Bekaert, Germain Fenger, Juan Andres Torres, Le Hong, Rachit Gupta, Yuan He, Junjiang Lei, James Word, George P. Lippincott
Publikováno v:
Alternative Lithographic Technologies VII.
In this paper, we present an optimization methodology for the template designs of sub-resolution contacts using directed self-assembly (DSA) with grapho-epitaxy and immersion lithography. We demonstrate the flow using a 60nm-pitch contact design in d
Autor:
Yuansheng Ma, Geert Vanderberghe, J. Andres Torres, Julien Ryckaert, James Word, Germain Fenger, Joost Bekaert, Yuri Granik
Publikováno v:
SPIE Proceedings.
Directed self assembly has become a very attractive technology for Fin and contact/via applications. Some of the issues related to pattern placement error, defectivity rates and process integration are actively being addressed by the industry and hav
Autor:
Germain Fenger, Neal Lafferty, J. Andres Torres, Le Hong, Geert Vanderberghe, Joost Bekaert, Junjiang Lei, George P. Lippincott, Rachit Gupta, James Word, Alexander Tritchkov, Yuan He, Yuansheng Ma
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 14:031216
We present an optimization methodology for the template designs of subresolution contacts using directed self-assembly (DSA) with graphoepitaxy and immersion lithography. We demonstrate the flow using a 60-nm-pitch contact design in doublet with Mont