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pro vyhledávání: '"Gary A. DePinto"'
Autor:
Gary A. DePinto
Publikováno v:
Journal of the IEST. 36:31-38
This paper describes a three-step approach to characterize a low-pressure chemical vapor deposition (LPCVD) flat polysilicon process. The first step was to design and construct a flat polysilicon deposition furnace for reduced defectivity and improve
Publikováno v:
SPIE Proceedings.
Continual improvements in yield, reliability and manufacturability measure a fab and ultimately result in Total Customer Satisfaction. A new organizational and technical methodology for continuous defect reduction has been established in a formal fee