Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Gardiner, Allen B."'
Autor:
Sean D. Burns, Gerard M. Schmid, C. Grant Willson, Paula M. Wetmore, Lewis W. Flanagin, Gardiner Allen B, Val J. Krukonis, Jodie L. Lutkenhaus
Publikováno v:
SPIE Proceedings.
This work focuses on understanding the dissolution phenomenon of surface inhibition, which is observed often in the development of novolac based resists. Many theories have been offered to explain this phenomenon, including a concentration gradient o
Publikováno v:
Advances in Resist Technology and Processing XIV.
Prism coupling is applied to thick film DNQ/novolak photoresist materials in the 4.6 to 24 micrometer range. Refractive indices are obtained as a function of softbake temperature and softbake time for exposed and unexposed resists. The results for AZ
Autor:
C. Grant Willson, Sanju Pancholi, Ralph R. Dammel, Clifford L. Henderson, Gardiner Allen B, Chris A. Mack, William J. Koros, Anwei Qin, William D. Hinsberg
Publikováno v:
Advances in Resist Technology and Processing XIV.
Simulation of the microlithographic process plays an increasingly important role in the manufacturing of integrated circuitry. Unfortunately, most lithography simulations still lack fundamental relationships that link the resist chemistry and the fin
Autor:
Katherine E. Mueller, C. Grant Willson, Ralph R. Dammel, William J. Koros, Gardiner Allen B, Chris A. Mack, Anwei Qin
Publikováno v:
Advances in Resist Technology and Processing XIV.
A first-principles study into the effects of residual casting solvent on the lithographic properties of photoresist has been initiated. Solvent content has been measured using a quartz crystal microbalance and using radio-labeled solvent with scintil
Autor:
Burns, Sean D., Gardiner, Allen B., Krukonis, Val J., Wetmore, Paula M., Lutkenhaus, Jodie, Schmid, Gerard M., Flanagin, Lewis W., Willson, C. Grant
Publikováno v:
Proceedings of SPIE; Nov2001, Issue 1, p37-49, 13p
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19:136
The resolution of the microlithography process used to manufacture semiconductor devices is a function of many variables. One interesting and important contributor to resolution is the “surface induction” phenomenon that occurs during development
Autor:
Katherine E. Mueller, Chris A. Mack, Ralph R. Dammel, John P. Sagan, Gardiner Allen B, Carlton G Willson
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16:3779
A semi-empirical study into the effects of residual casting solvent on the lithographic properties of photoresist is described. Solvent content of a commercial i-line photoresist after postapply bake has been measured using a quartz crystal microbala
Autor:
Mack, Chris A., Mueller, Katherine E., Gardiner, Allen B., Qin, Anwei, Dammel, Ralph R., Koros, William J., Willson, C. Grant
Publikováno v:
Proceedings of SPIE; Nov1997, Issue 1, p355-362, 8p
Autor:
Ficner, Stanley A., Dammel, Ralph R., Perez, Yvette M., Gardiner, Allen B., Willson, C. Grant
Publikováno v:
Proceedings of SPIE; Nov1997, Issue 1, p838-849, 12p
Autor:
Gardiner, Allen B., Qin, Anwei, Henderson, Clifford L., Pancholi, Sanju, Koros, William J., Willson, C. Grant, Dammel, Ralph R., Mack, Chris A., Hinsberg, William D.
Publikováno v:
Proceedings of SPIE; Nov1997, Issue 1, p850-860, 11p