Zobrazeno 1 - 10
of 78
pro vyhledávání: '"Gao, Sitian"'
Publikováno v:
In Computers and Chemical Engineering January 2023 169
Publikováno v:
In Ultramicroscopy December 2020 219
Autor:
Zhang, Airui, Jin, Axiang, Wang, Hai, Wang, Xiaokang, Zha, Pengfei, Wang, Meiling, Song, Xiaoping, Gao, Sitian
Publikováno v:
In Spectrochimica Acta Part B: Atomic Spectroscopy March 2018 141:7-14
Publikováno v:
Journal of Aeronautical Materials, Vol 38, Iss 2, Pp 96-103 (2018)
High resolution electron microscopy imaging and geometric phase analysis were employed to study the microstructure and strain states of Nb/Si interface prepared at different sputtering pressures. The results show that the surface of Nb thin film cons
Externí odkaz:
https://doaj.org/article/8de1df6d62da4d049fa3dac09ae9f511
Publikováno v:
In Journal of Materials Science & Technology August 2017 33(8):815-820
Publikováno v:
Jixie chuandong, Vol 41, Pp 70-74 (2017)
The precision platform is a kind of high precision working platform which can provide the micrometer displacement. In precision platform design,flexible hinge structure is widely used as mechanism of transmission. The flexible hinge plays the key rol
Externí odkaz:
https://doaj.org/article/a8d32be2fee945329aa3669ea7e1197c
Publikováno v:
Optoelectronics Letters. 17:170-175
A precise and noninvasive method for the size and shape measurement of gold nanorods (GNRs) has been proposed based on depolarized dynamic light scattering (DDLS). A home-made DDLS apparatus has been established. By applying depolarized optical path
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::664e9912eccfdc9226c8db56dd369631
https://doi.org/10.1007/s11801-021-0140-4
https://doi.org/10.1007/s11801-021-0140-4
Akademický článek
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Publikováno v:
Applied Physics B. 126
Dynamic light scattering (DLS) is a widely used, non-invasive and in-situ method for particle size measurement. However, the precision of the measurement results is still under discussion. Theoretically, the apparent hydrodynamic diameter measured by
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39745e280486d84e4c6629b5f42f81fe
https://doi.org/10.1007/s00340-020-07515-3
https://doi.org/10.1007/s00340-020-07515-3
Publikováno v:
Ultramicroscopy. 219
Atomic force microscopy (AFM) is widely used for nano-dimensional metrology in semiconductor manufacturing and metrological system. However, the conventional AFM can't provide accurate CD characterization of nanostructures, due to its top-down config
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::efa7e056095a63c275917c0b09c58935
https://pubmed.ncbi.nlm.nih.gov/32977060
https://pubmed.ncbi.nlm.nih.gov/32977060