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Autor:
Michael J. Shapiro, R. A. Jake, Galina Neumeier, David N. Hill, W. J. Lackey, Andrew J. Green, John R. Thompson, K. R. Efferson, John A. Hanigofsky, E. Kent Barefield, T. S. Moss, William Brent Carter, D.F. O'Brien
Publikováno v:
Applied Physics Letters. 56:1175-1177
A process has been developed that enables the rapid chemical vapor deposition of superconducting YBa2Cu3Ox. In this process a finely ground mixture of Y(tmhd)3, Ba(tmhd)2, and Cu(tmhd)2 (tmhd=2,2,6,6‐tetramethyl‐3,5‐heptanedionate) is slowly fe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a63a5859bc04e0437508ad3d120c9d73
https://doi.org/10.1063/1.103330
https://doi.org/10.1063/1.103330
