Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Gael Druais"'
Publikováno v:
2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM).
In this paper, wet cleaning solution compatible with cobalt are investigated to achieve low Co etching rate on blankets film and no film attack on patterned 14nm wafer after line and via etching. Proposed solutions are compared to conventional wet cl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4aa8f803a9e564388993a72e41bf8c31
https://doi.org/10.1109/iitc-mam.2015.7325635
https://doi.org/10.1109/iitc-mam.2015.7325635
