Zobrazeno 1 - 10
of 325
pro vyhledávání: '"G.R. Booker"'
Publikováno v:
Microscopy of Semiconducting Materials 2001 ISBN: 9781351074629
The behaviour of fluorine in as-deposited polysilicon (p-Si) and as-deposited amorphous Si (a-Si) layers after annealing in the range 600-950C us investigated. The p-Si and a-Si were deposited by LPCVD at 610 and 560C, respectively, implanted with F
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https://doi.org/10.1201/9781351074629-78
https://doi.org/10.1201/9781351074629-78
Compositional profiles across CdTe/Cd y Hg 1- y Te interfaces in bulk specimens have been determined from backscattered electron (BSE) atomic-number contrast line profiles obtained using the scanning electron microscope. To improve the spatial resolu
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https://ora.ox.ac.uk/objects/uuid:e6ee0c5e-86ec-40c1-8778-b18bcc9a87a3
https://ora.ox.ac.uk/objects/uuid:e6ee0c5e-86ec-40c1-8778-b18bcc9a87a3
Self-assembled Sb-based quantum dots (QDs) were grown by metal-organic vapour phase epitaxy and assessed by means of atomic force microscopy, transmission electron microscopy and photoluminescence. Two series of InSb QDs in a GaSb matrix were grown a
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https://ora.ox.ac.uk/objects/uuid:3b44c170-ae9f-4263-9c08-667eedc31b2e
https://ora.ox.ac.uk/objects/uuid:3b44c170-ae9f-4263-9c08-667eedc31b2e
Autor:
P. Möck, E. Aphandéry, N.J. Mason, Nigel D. Browning, Robin J. Nicholas, Teya Topuria, G.R. Booker
Publikováno v:
Materials Science and Engineering: B. 80:112-115
Self-assembled InSb quantum dots (QDs) were grown by metal-organic vapour phase epitaxy (MOVPE) in a GaSb matrix. Atomic force microscopy (AFM), conventional diffraction contrast transmission electron microscopy (CTEM), high resolution transmission e
Publikováno v:
IEEE Transactions on Electron Devices. 48:2506-2513
This paper investigates the effects of an in-situ hydrogen bake and an ex-situ hydrofluoric acid (HF) etch prior to polysilicon deposition on the electrical characteristics of bipolar transistors fabricated with low thermal budget in-situ phosphorus-
Publikováno v:
Journal of Applied Physics. 87:7567-7578
A comprehensive study is made of the behaviour and effects of fluorine in n+ polysilicon layers. Sheet resistance, TEM and SIMS are used to obtain quantitative data for the breakup of the interfacial oxide, the epitaxial regrowth of the polysilicon a
Publikováno v:
Scopus-Elsevier
Publikováno v:
Key Engineering Materials. :513-520
Publikováno v:
Scopus-Elsevier
Publikováno v:
Key Engineering Materials. :505-512