Zobrazeno 1 - 10
of 14
pro vyhledávání: '"G. V. Treyz"'
Publikováno v:
Applied Physics Letters. 59:771-773
Silicon Mach–Zehnder waveguide modulators have been fabricated and operation characterized at the wavelength of 1.3 μm. Device operation is based on the free‐carrier‐induced change in the refractive index of silicon. Modulation depths of −4.
Publikováno v:
IEEE Electron Device Letters. 12:276-278
Silicon optical waveguide modulators, appropriate for operation in the 1.3-1.55 mu m wavelength region, have been fabricated and their performance characterized at the wavelength of 1.3 mu m. The modulator structures consist of p-i-n diodes integrate
Publikováno v:
Applied Physics Letters. 57:1078-1080
For applications such as optical interconnects1 it is desirable to have the ability to integrate optical modulators, waveguides and silicon electronics. One system of interest is the class of GaAs multiple quantum well (MQW) structures where optical
Integrated Rib Waveguide-Photodetector Using Si/Si1−xGex Multiple Quantum Wells for Long Wavelenghts
Publikováno v:
MRS Proceedings. 220
We have investigated the structural, electrical, and optical quality of epitaxial Si and Si1−xGex films grown by MBE on SIMOX (Separation by IMplanted OXygen) silicon substrates. Epitaxial films grown on these SOI substrates have been characterized
Publikováno v:
Electronics Letters. 28:159
Silicon germanium waveguides with losses of less than 1 dB/cm have been fabricated and characterised at 1-32/nn. Propagation losses are as low as 0-62dB/cm for TM polarised light and 0-50dB/cm for TE polarised light.
Autor:
G. V. Treyz
Publikováno v:
Electronics Letters. 27:118
Mach-Zehnder waveguide interferometers have been fabricated in silicon and operation has been demonstrated at λ = 1.3 μm. The switching mechanism is based on the thermally induced variation of the refractive index of crystalline silicon. Modulation
Publikováno v:
Applied Physics Letters. 50:475-477
Deep trenches have been etched in crystalline silicon with polarization‐controlled, variable curvature walls. Scan speeds of up to 10 mm/s have been demonstrated. A qualitative understanding of the etching process has been developed which is based
Publikováno v:
Applied Physics Letters. 54:561-563
Ultraviolet laser photolysis of chlorine (λ=350–360 nm) has been used to produce a microscopic atomic chlorine source. Crystalline silicon has been etched and deep through‐wafer vias have been fabricated. The etching process has been modeled as
Publikováno v:
Applied Physics Letters. 55:896-898
A unique method of patterning YBaCuO thin films based on the inhibition of superconductivity by Si‐YBaCuO intermixing has been developed. In the experiment, a thin Si film was first evaporated on a MgO substrate and subsequently patterned using las
Publikováno v:
Applied Physics Letters. 55:346-348
A deep ultraviolet cw laser has been used to form vias in a polyimide film. The etched features have smooth sidewalls and high aspect ratios. The observations are consistent with an etching mechanism based on thermal decomposition.