Zobrazeno 1 - 10
of 47
pro vyhledávání: '"G. Salmaso"'
Publikováno v:
Earth and Space Science, Vol 9, Iss 8, Pp n/a-n/a (2022)
Abstract Characterizing spatial heterogeneity is fundamental in numerous areas, yet defining spatial patterns often depends on qualitative assessments or a priori knowledge. Lacunarity analysis is a popular occupancy‐based method for identifying re
Externí odkaz:
https://doaj.org/article/0d6aeb166fcd4b4195480bc72cde9d80
Autor:
Raymond Maas, G. Salmaso
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
With EUV lithography now a stable part of the chip Industry production processes, the attention and demand for higher productivity is more pressing than ever. To support customers' demands, ASML has developed the next generation EUV pellicle, increas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::633fe6f3a253fab2dec95ee944d5a5e0
https://doi.org/10.1117/12.2600854
https://doi.org/10.1117/12.2600854
Autor:
G. Salmaso, Jacopo Ravagnan, D. Silvestrini, Valentino Rigato, Elza Bontempi, Laura E. Depero, Alessandro Patelli
Publikováno v:
Applied Surface Science. 238:262-268
Mo/Si multilayer mirrors with reflectance higher than 70% at 13 nm have been developed in last years by the introduction of diffusion barriers, but many physical aspects concerning their growth and interface formation need to be investigated. As a ma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b87d933ad6178a6354494ffe8e7ce1f7
https://doi.org/10.1016/j.apsusc.2004.05.176
https://doi.org/10.1016/j.apsusc.2004.05.176
Autor:
Gianluigi Maggioni, V. Mattarello, G. Salmaso, Maria Guglielmina Pelizzo, V. Rigato, Piergiorgio Nicolosi, Alessandro Patelli, Laura E. Depero, Elza Bontempi, Paolo Mazzoldi
Publikováno v:
Surface and Coatings Technology. :40-48
A study of Mo/a-Si:H multilayer for EUV mirrors produced by rf-magnetron sputtering in pure Ar, Xe and Ar/H 2 gas mixtures is presented. The high reflectance mirrors are designed for solar space experiments at 17, 19 and 30.4 nm and for the lithograp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0ffa9fa78489bf01236380357e8a6931
https://doi.org/10.1016/s0257-8972(03)00706-0
https://doi.org/10.1016/s0257-8972(03)00706-0
Akademický článek
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Autor:
Fabio Marioni, Dervis Vernani, G. Pareschi, Gabriele Grisoni, G. Tagliaferri, Stefano Basso, Giuseppe Valsecchi, G. Salmaso, Oberto Citterio, G. Borghi, E. Marchi Boscolo, Daniele Spiga, A. Ritucci, J. Kools, Massimiliano Rossi, Barbara Negri, A. Orlandi
Publikováno v:
SPIE Proceedings.
High throughput lightweight Hard X-ray Optics manufactured via electroforming replication process from supersmooth mandrels are the primary candidate for some of future New Hard X-ray missions. Media Lario Technologies (MLT) is the industrial enabler
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fe9b89add529e5b6edf720ec427285e5
https://doi.org/10.1117/12.828191
https://doi.org/10.1117/12.828191
Autor:
Juri Bertoli, V. Mattarello, Daniele Spiga, Enrico Boscolo Marchi, G. Tagliaferri, G. Salmaso, Denis Garoli, Giovanni Pareschi, Jacques Kools
Publikováno v:
SPIE Proceedings.
Depth-graded multilayer structures are widely considered as the preferred technology for the next generation of hard X-ray telescopes operating in the spectral range up to several tens of keV. This contrasts to earlier generation telescopes which ope
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc8e6360fd0ea46df3a28c9d9f0f2644
https://doi.org/10.1117/12.820428
https://doi.org/10.1117/12.820428
Autor:
M. Prea, Giovanni Bianucci, Max C. Schürmann, Fabio Zocchi, G. Salmaso, Giuseppe Valsecchi, Arnaud Mader, Gian Luca Cassol, J. Kools, Denis Bolshukhin, Peter Zink, Guido Schriever
Publikováno v:
Alternative Lithographic Technologies.
The power roadmap for EUVL high volume manufacturing (HVM) exceeds the 200W EUV in-band power at intermediate focus, thus posing more demanding requirements on HVM sources, debris suppression systems and collectors. Starting from the lessons learned
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0007f316e0cd330eef8f9968c067ad0
https://doi.org/10.1117/12.813652
https://doi.org/10.1117/12.813652
Autor:
Francesco d'Acapito, G. Salmaso, Mauro Rovezzi, Alessandro Patelli, Elza Bontempi, V. Rigato, Ivan Davoli
Publikováno v:
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
246 (2006): 127–130. doi:10.1016/j.nimb.2005.12.023
info:cnr-pdr/source/autori:Rovezzi, M; D'Acapito, F; Patelli, A; Rigato, V; Salmaso, G; Bontempi, E; Davoli, I/titolo:Characterization of thermally treated Mo%2FSi multilayer mirrors with standing wave-assisted EXAFS/doi:10.1016%2Fj.nimb.2005.12.023/rivista:Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (Print)/anno:2006/pagina_da:127/pagina_a:130/intervallo_pagine:127–130/volume:246
Università degli Studi di Brescia-IRIS
246 (2006): 127–130. doi:10.1016/j.nimb.2005.12.023
info:cnr-pdr/source/autori:Rovezzi, M; D'Acapito, F; Patelli, A; Rigato, V; Salmaso, G; Bontempi, E; Davoli, I/titolo:Characterization of thermally treated Mo%2FSi multilayer mirrors with standing wave-assisted EXAFS/doi:10.1016%2Fj.nimb.2005.12.023/rivista:Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (Print)/anno:2006/pagina_da:127/pagina_a:130/intervallo_pagine:127–130/volume:246
Università degli Studi di Brescia-IRIS
In the last years multilayer mirrors for applications in the extreme ultra-violet (ELTV) region have reached high reflectivity performances, leading such optics suitable for new generation lithography and astrophysical applications. One of the most s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::774399b123fab6c096de7e1e4d2ab7a2
http://hdl.handle.net/11379/22272
http://hdl.handle.net/11379/22272
Autor:
Saulius Kaciulis, Valentino Rigato, G. Carta, Gilberto Rossetto, Marco Natali, Silvio Restello, G. Salmaso, Pierino Zanella, Alessio Mezzi
Publikováno v:
Chemical vapor deposition
11 (2005): 375–380. doi:10.1002/cvde.200406360
info:cnr-pdr/source/autori:Carta G.; Natali M.; Rossetto G.; Zanella P.; Salmaso G.; Restello S.; Rigato V.; Kaciulis S.; Mezzi A./titolo:A comparative study of Cr2O3 thin films obtained by MOCVD using three different precursors/doi:10.1002%2Fcvde.200406360/rivista:Chemical vapor deposition (Print)/anno:2005/pagina_da:375/pagina_a:380/intervallo_pagine:375–380/volume:11
11 (2005): 375–380. doi:10.1002/cvde.200406360
info:cnr-pdr/source/autori:Carta G.; Natali M.; Rossetto G.; Zanella P.; Salmaso G.; Restello S.; Rigato V.; Kaciulis S.; Mezzi A./titolo:A comparative study of Cr2O3 thin films obtained by MOCVD using three different precursors/doi:10.1002%2Fcvde.200406360/rivista:Chemical vapor deposition (Print)/anno:2005/pagina_da:375/pagina_a:380/intervallo_pagine:375–380/volume:11
Thin films of chromia (Cr 2 O 3 ) for anti-wear protection were grown by metal-organic (MO)CVD on AISI 304 stainless steel, soda-lime glass, and (001) silicon substrates. The structural, morphological, and chemical compositions were compared for film
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fe381cfea20517151958f7d38b0d3816
http://www.cnr.it/prodotto/i/170082
http://www.cnr.it/prodotto/i/170082